Construction method of plasma nano-array for enhancing quantum dot fluorescence
A nano-array, plasma technology, applied in the fields of nanotechnology, nanotechnology, nano-optics for materials and surface science, can solve the problems of complex preparation process and low efficiency, and achieve the effect of enhancing fluorescence intensity
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[0034] Such as figure 1 Shown, a kind of construction method that is used to enhance the plasmonic nano-array of quantum dot fluorescence, it comprises the following steps:
[0035] ①Preparation of plasmonic nano-arrays: Si nano-pillar arrays with a period of 500 nm, a square column size of 275 nm×275 nm, and a square column height of 300 nm produced by Danish NIL Technology Company were used as templates, and the IPS substrate (provided by Obducat Company of Sweden) was used as a template. ) to construct an IPS square hole array by nanoimprinting technology, and then use resistive thermal evaporation to deposit a gold film to obtain a plasmonic nanoarray with a sub-wavelength EOT phenomenon, and at the same time obtain a gold nanoarray substrate with a specific SPR peak position.
[0036] The conditions for nanoimprinting are as follows: first, the temperature was raised to 150 °C and kept at normal pressure for 5 s, and then kept at 20 bar for 30 s, and then the temperature ...
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