Scanning electron microscope in-situ electrochemical detection chip and manufacturing method thereof
An in-situ electrochemical and scanning electron microscope technology, applied in chemical instruments and methods, ion implantation plating, coating, etc., can solve the problem of inaccurate post-control potential, achieve simple operation, high safety, and reduce background noise. Effect
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Embodiment 1
[0044] Embodiment 1 of the present invention discloses a scanning electron microscope in-situ electrochemical detection chip, such as Figure 1~5 As shown, its structure includes an upper sheet 1 and a lower sheet 7. The upper sheet 1 is made of an upper silicon substrate 3, and the upper silicon substrate 3 is provided with a first upper silicon nitride layer 2 and a first lower silicon nitride layer 4; a first upper silicon nitride layer is provided 2 and the upper silicon substrate 3 of the first lower silicon nitride layer 4 are provided with two symmetrical liquid injection ports 5 and a viewing window 6; the lower sheet is made of the lower silicon substrate 12, and the lower silicon A first upper insulating layer 10 and a second upper silicon nitride layer 11 are provided above the substrate 12, and a first lower insulating layer 14 and a second lower silicon nitride layer 13 are provided below the lower silicon substrate 12. One side of the substrate 12 is provided wi...
Embodiment 2
[0070] Embodiment 2 of the present invention discloses a scanning electron microscope in-situ electrochemical detection chip, such as Figure 1~5 As shown, its structure includes an upper sheet 1 and a lower sheet 7. The upper sheet 1 is made of an upper silicon substrate 3, and the upper silicon substrate 3 is provided with a first upper silicon nitride layer 2 and a first lower silicon nitride layer 4; a first upper silicon nitride layer is provided 2 and the upper silicon substrate 3 of the first lower silicon nitride layer 4 are provided with two symmetrical liquid injection ports 5 and a viewing window 6; the lower sheet is made of the lower silicon substrate 12, and the lower silicon A first upper insulating layer 10 and a second upper silicon nitride layer 11 are provided above the substrate 12, a first lower insulating layer 14 and a second lower silicon nitride layer 13 are provided below the lower silicon substrate 12, and a first One side of the silicon substrate 1...
Embodiment 3
[0096] Embodiment 3 of the present invention discloses a scanning electron microscope in-situ electrochemical detection chip, such as Figure 1~5 As shown, its structure includes an upper sheet 1 and a lower sheet 7. The upper sheet 1 is made of an upper silicon substrate 3, and the upper silicon substrate 3 is provided with a first upper silicon nitride layer 2 and a first lower silicon nitride layer 4; a first upper silicon nitride layer is provided 2 and the upper silicon substrate 3 of the first lower silicon nitride layer 4 are provided with two symmetrical liquid injection ports 5 and a viewing window 6; the lower sheet is made of the lower silicon substrate 12, and the lower silicon A first upper insulating layer 10 and a second upper silicon nitride layer 11 are provided above the substrate 12, a first lower insulating layer 14 and a second lower silicon nitride layer 13 are provided below the lower silicon substrate 12, and a first One side of the silicon substrate 1...
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