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Etching solution and etching device

An etchant and a range of technologies, which are applied in the field of etching, can solve problems such as the reduction of the yield rate of the display panel and the corrosion of the substrate, and achieve the effect of improving the yield rate and avoiding corrosion

Active Publication Date: 2021-01-01
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Among them, the excess copper needs to be etched with an etching solution, but the existing etching solution generally contains fluorine, which has a corrosive effect on the substrate, resulting in a decrease in the yield of the display panel

Method used

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  • Etching solution and etching device
  • Etching solution and etching device
  • Etching solution and etching device

Examples

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Embodiment Construction

[0025] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the present invention can be practiced. The directional terms mentioned in the present invention, such as "up", "down", "front", "back", "left", "right", "inside", "outside", "side", etc., are for reference only The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention.

[0026] In the figures, structurally similar units are denoted by the same reference numerals.

[0027] Reference herein to an "embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment can be included in at least one embodiment of the present invention. The occurrences of this phrase in various places in the specification are not necessarily all referring to the same embodiment, nor are separa...

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Abstract

The invention provides an etching solution and an etching device. The etching solution comprises hydrogen peroxide, a regulating agent, a stabilizer, organic acid, an inhibitor, a de-foaming agent, alcohol substances and deionized water. The etching device comprises a storage part for storing the etching solution, a detecting part for detecting whether gas bubbles exist in the etching solution inthe storage part or not, a generating part for generating ultrasonic waves to clear gas bubbles while the detecting part detects the gas bubbles to obtain the etching solution with gas bubbles removed, and a spray nozzle for coating the etching solution with gas bubbles removed onto a base plate for etching the base plate. According to the scheme adopted by the invention, the etching solution doesnot comprise fluorine, avoids corrosion on the base plate, and increases the yield of a display panel.

Description

technical field [0001] The invention relates to the technical field of etching, in particular to an etching solution and an etching device. Background technique [0002] With the popularity of smart mobile terminals, display panel technology has been widely used, and its development is becoming more and more rapid. [0003] In the display panel manufacturing process, copper metal is usually used to make gate lines, data lines and other traces to transmit various signals and realize the display function of the display panel. Specifically, a copper film can be coated on the substrate, and then the copper film can be patterned to form various metal lines. [0004] Wherein, the excess copper needs to be etched with an etching solution. However, the existing etching solution generally contains fluorine, which has a corrosive effect on the substrate, resulting in a decrease in the yield of the display panel. Contents of the invention [0005] The object of the present inventio...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23F1/18C23F1/02C23F1/08
Inventor 赵芬利秦文张月红
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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