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Photocurable composition and photocurable film formed therefrom

A photocurable and composition technology, applied in the field of photocurable film and photocurable composition, can solve the problems of fine patterning limitation and composition viscosity increase, and achieve the improvement of time-dependent instability and sufficient cross-linking degree. , to achieve the effect of fine patterning

Active Publication Date: 2022-07-01
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] However, when an alkali-soluble resin is included, the viscosity of the composition increases and there is a limit in achieving the desired fine patterning

Method used

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  • Photocurable composition and photocurable film formed therefrom
  • Photocurable composition and photocurable film formed therefrom
  • Photocurable composition and photocurable film formed therefrom

Examples

Experimental program
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experiment example

[0186] The compositions of Tables 1 and 2 or the photocured films formed from these compositions were evaluated for viscosity, coating flatness, surface curing characteristics, and Martens hardness by the evaluation methods described later.

[0187] (1) Viscosity measurement

[0188] Using a viscometer (DV3T, manufactured by Brookfield Corporation), the viscosity of the compositions of Examples and Comparative Examples was measured (measurement conditions: 20 rpm / 25° C.).

[0189] (2) Coating flatness

[0190] Figure 4 It is a schematic plan view for demonstrating the coating flatness measurement method in the experimental example of this application.

[0191] The compositions of Examples and Comparative Examples were spin-coated on a 4-inch silicon wafer so that the film thickness after curing was 1.5 μm to form a coating film, and then a UV curing device (model: LZ-UVC-F402-CMD) was used. The ultraviolet rays were irradiated for 30 seconds, and then the film thicknes...

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Abstract

The present invention provides a photocurable composition and a photocurable film formed therefrom. The above-mentioned photocurable composition contains a dithiol compound, a difunctional or higher unsaturated polymerizable compound, and a photoinitiator, and has a viscosity of 15 cp or less at room temperature. By low-viscosity fine printing from the photocurable composition, a photocurable film having high-density crosslinking properties can be formed.

Description

technical field [0001] The present invention relates to a photocurable composition and a photocurable film formed from the photocurable composition. More specifically, it relates to a photocurable composition containing a photopolymerizable monomer and a photocurable film formed from the photocurable composition. Background technique [0002] Photosensitive compositions are used to form various photo-curable insulating patterns such as photoresists, insulating films, protective films, black matrices, and column spacers of display devices, for example. After applying the photosensitive composition, a photocurable film or a photocured pattern of a predetermined shape can be formed in a desired region by an exposure step and / or a development step. The above-mentioned photosensitive composition is required to have, for example, high sensitivity to ultraviolet light exposure, polymerization reactivity, and a pattern formed from the photosensitive composition needs to have improv...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G03F7/027H01L51/52
CPCG03F7/0275G03F7/004H10K50/844
Inventor 赵庸桓金在成朴汉雨
Owner DONGWOO FINE CHEM CO LTD