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Preparation method of structural color based on atomic layer deposition and product with structural color

An atomic layer deposition and structural color technology, applied in coatings, metal material coating processes, gaseous chemical plating, etc., can solve the problems of uneven thickness, uneven color, low deposition rate, etc., to save raw materials, surface Uniform color and film uniformity

Inactive Publication Date: 2019-07-26
NANTONG TEXTILE & SILK IND TECH RES INST +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The structural color film produced by this method has good uniformity, good film density, and good industrial applicability, but it has directionality. If it is a three-dimensional substrate, different interfaces will cause uneven thickness, resulting in uneven color.
[0006] c: Atomic layer deposition, only one layer of film can be deposited in one reaction, with extremely uniform thickness and excellent conformality, but this method has low deposition rate and high cost

Method used

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  • Preparation method of structural color based on atomic layer deposition and product with structural color

Examples

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preparation example Construction

[0027] The preparation method of structural color based on atomic layer deposition of the present invention adopts atomic layer deposition equipment, comprising the following steps:

[0028] Provide samples, deposition materials and deposition gas; the sample is a three-dimensional structure with a three-dimensional complex surface; the deposition material includes water and a precursor, and the precursor includes tetraisopropyl titanate; the deposition gas includes the first inert gas and second inert gas;

[0029] Putting the sample into the cavity of the atomic layer deposition equipment for preheating;

[0030] Put the preheated sample at a reaction temperature of 120-180°C and a gas flow rate of 40-60cm 3 Atomic layer deposition was carried out under the conditions of / min to deposit TiO on the sample 2 Thin films, obtained samples deposited with structural color. .

[0031] In the present invention, the cavity of the atomic layer deposition equipment is a closed circ...

Embodiment 1

[0034] 1. 3D printing substrate: In this embodiment, PreForm software is used for drawing and printing. By selecting a suitable formfile (three-dimensional image), it is printed by 3D printing technology (circular substrate, the diameter of which is 2cm). The steps of 3D printing are: pour the photosensitive resin into the printing tank, open the software PreForm, determine the size of the model, the diameter of the ring is 2cm, the height is 9mm, select the support, and then click print to get the 3D printed object. After the printing is completed, put the 3D printed object into the isopropanol solution and vibrate for 30 minutes, wash away the uncured solution of 3D printing, and then put it in a 60° oven for 30 minutes for complete curing, and then carefully remove the 3D printed object with a knife The support of the surface, that is, the 3D printing substrate;

[0035] 2. Atomic layer deposition preheating: put the 3D printed substrate into the atomic layer deposition cha...

Embodiment 2

[0039] Using the same method as in Example 1, the difference is that the number of deposition cycles is 4000 times, and the TiO obtained at this time 2 The thickness of the film is 450 nm, and the structural color of the obtained product is blue.

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Abstract

The invention relates to a preparation method of a structural color based on atomic layer deposition and a product with the structural color. The preparation method adopts atomic layer deposition equipment, and comprises the following steps that a sample, a deposition material and deposition gas are prepared; the deposition material comprises water and a precursor, wherein the precursor comprisestetraisopropyl titanate, and the deposition gas comprises first inert gas and second inert gas; the sample is put into a cavity of the atomic layer deposition equipment for being preheated; and the preheated sample is subjected to atomic layer deposition under the conditions that the reaction temperature is 120-180 DEG C, and the gas flow rate is 40-60 cm<3> / min, and in the atomic layer depositionprocess, a water pulse adsorption reaction, first inert gas expulsion, a precursor pulse adsorption reaction and second inert gas expulsion are conducted to obtain a sample with the deposited structural color. According to the method, a uniform TiO2 film with a certain thickness is deposited on the surface of a product through an atomic layer deposition method, and due to the interference effectof the uniform TiO2 film, the color is generated on the surface of the product, so that the structural color which can uniformly cover the surface of the product is prepared.

Description

technical field [0001] The invention relates to a preparation method of structural color based on atomic layer deposition and a product with structural color. Background technique [0002] There are many methods for coating, such as atomic layer deposition, magnetron sputtering, spin coating, chemical vapor deposition, thermal evaporation, etc. The water and precursor raw materials are alternately introduced into the reaction chamber in sequence, and a monoatomic layer is formed after a chemical reaction. The method of coating a substance layer by layer on the surface of a substrate in the form of a monoatomic layer film to form a uniform film is called atomic layer deposition. [0003] Structural color is also called physical color. The color produced by light irradiation on objects with microspheres, thin films or gratings due to the change of light interference refraction and diffraction is called structural color. Structural color has a wide range of applications in ma...

Claims

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Application Information

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IPC IPC(8): C23C16/455C23C16/40C23C16/52
CPCC23C16/405C23C16/45525C23C16/52
Inventor 胡建臣张克勤左丽娜彭瑜尹菲郭贺虎
Owner NANTONG TEXTILE & SILK IND TECH RES INST
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