Laser processing device and method for film material removal
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- WUHAN HGLASER ENG CO LTD
- Publication Date
- 2019-08-16
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Abstract
Description
technical field
[0001] The invention relates to the field of laser technology, in particular to a laser processing device and method for removing thin film materials. Background technique
[0002] With the development of laser technology and the deepening of laser research, the application fields and application methods of laser processing have also expanded, and the requirements are also extremely high. The general laser output is the fundamental mode, and the cross-sectional light intensity in the beam propagation direction is Gaussian distribution, such as figure 1 As shown, it shows a distribution that is strong in the middle and gradually weakens around the periphery. Therefore, when the laser with Gaussian irradiance distribution is used to selectively remove thin film materials on the surface of heat-sensitive substrates, due to the difference in light intensity between the middle region and the edge region, or the middle region reaches a suitable energy density in a...