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Device and method for preparing diamond film with electric deflection function

A technology of diamond film and preparation device, applied in metal material coating process, gaseous chemical plating, coating and other directions, can solve the problems of limited quality and speed of diamond film preparation

Pending Publication Date: 2019-08-23
郝昕曈
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The present invention provides a diamond film preparation device and method with electric deflection in order to solve the problem of limited preparation quality and speed when using the hot wire chemical vapor deposition method to prepare a large area of ​​diamond film

Method used

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  • Device and method for preparing diamond film with electric deflection function
  • Device and method for preparing diamond film with electric deflection function
  • Device and method for preparing diamond film with electric deflection function

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Embodiment Construction

[0022] A diamond film preparation device with electric deflection, comprising a cylindrical reaction chamber 1, an outer water pipe 2, a disc-shaped carrier 3, an inner water pipe 4, radial support rods 5, a disc-shaped water cooling chamber 6, Drive motor 7, drive gear 8, circular supporting plate 9, L-shaped support rod 10, conductive contact 11, transmission ring 12, wheel shaft 13, transmission gear 14, collector ring 15, transmission rod 16, cylindrical Mounting seat 17, rectangular conductive grid 18, conductive rod 19, electric brush 20, vertical mounting rod 21, radial mounting rod 22, inclined rod 23, hot wire array 24, lower circular large conductive grid 25, upper circle Shaped large conductive grid 26, trumpet-shaped air guide cover 27, U-shaped air guide pipe 28, lower circular small conductive grid 29, upper circular small conductive grid 30, discharge needle 31, grounding needle 32, air extraction hole 33, Rectangular window 34, first to tenth power supply;

[...

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Abstract

The invention relates to the technology of preparation of diamond films, in particular to a device and method for preparing a diamond film with an electric deflection function. The device and method solve the problem that when a hot wire chemical vapor deposition method is adopted for preparing the diamond film within a large area, the preparation quality and speed are limited. The device for preparing the diamond film with the electric deflection function comprises a cylindrical reaction chamber, an outer-layer water pipe, a round cake-shaped carrying table, an inner-layer water pipe, a radial supporting rod, a round cake-shaped water cooling cavity, a driving motor, a driving gear, an annular supporting plate, an L-shaped supporting rod, a conductive contact, a transmission ring, axles,transmission gears, collecting rings, transmission rods, a cylindrical mounting base, rectangular conductive meshes, conductive rods, electric brushes, a vertical mounting rod, radial mounting rods,diagonal members, a hot wire array, a lower round large conductive mesh, an upper round large conductive mesh, a trumpet-shaped air guide cover, a U-shaped air guide pipe, a lower round small conductive mesh, an upper round small conductive mesh, spray points and grounding pins. The device and method are suitable for preparing the diamond film within a large area.

Description

technical field [0001] The invention relates to a diamond film preparation technology, in particular to a diamond film preparation device and method with electric deflection. Background technique [0002] Diamond film is a functional material with various excellent properties, which is widely used in microelectronics, optoelectronics, biomedicine, machinery, aerospace, nuclear energy and other fields. At present, one of the main methods for large-scale preparation of diamond films is the hot-filament chemical vapor deposition method. However, practice has shown that when using the hot wire chemical vapor deposition method to prepare a large area of ​​diamond film, there are the following problems: due to the inhomogeneity of the plasma gas flow in the radial direction of the substrate, and the relative velocity between the plasma and the substrate is low , causing the deposition thickness of the diamond film to be uneven in the radial direction, and the deposition rate is l...

Claims

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Application Information

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IPC IPC(8): C23C16/513C23C16/27
CPCC23C16/271C23C16/276C23C16/513
Inventor 郝昕曈郝晋青郭欣和
Owner 郝昕曈
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