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286results about How to "Improve manufacturing speed" patented technology

IEC61850-based CAD electric power graphic generation analysis method

The invention discloses an IEC61850-based CAD electric power graphic generation analysis method, which comprises the steps of: defining more than one connecting terminal graphic block for equipment primitives and position regions calculated via supporting positions of connecting terminal graphic blocks according to an IEC61850 standard, and defining the actual information represented by the equipment primitives in the graphic blocks subordinative to the equipment primitives as an attribute; calculating the number of connecting terminals on the two ends of virtual terminals in a selected SCD file, calculating the spatial dimensions of the equipment primitives, arranging the primitives of the virtual terminals, and drawing connecting lines of the arranged primitives of the virtual terminals; acquiring terminals included by the primitives and absolute positions of the terminals according to the primitives of the virtual terminals, acquiring the connecting relation of the terminals, and outputting an SSD file according to the IEC61850 standard. The invention has the advantages of avoiding an error due to manual primitive connection, improving the making speed and level of intelligent transformer substation SCD and enhancing the design efficiency of a CAD electric power graphic.
Owner:CHINA ENERGY ENG GRP GUANGDONG ELECTRIC POWER DESIGN INST CO LTD

Ultrasonic and micro-forging composite device for improving microstructure and performance of additively manufactured metal and additive manufacturing method

The invention provides an ultrasonic and micro-forging composite device for improving the microstructure and performance of additively manufactured metal and an additive manufacturing method. The ultrasonic and micro-forging composite device comprises an energy converter, a pneumatic slider, a pneumatic slider connection frame, an amplitude transformer, a tool head and a roller. The energy converter is arranged in an energy converter shell, the energy converter shell is provided with an inserting piece and a pipeline connector, the amplitude transformer is connected to the lower end of the energy converter, the tool head is connected below the energy converter, the roller is located between the tool head and a workpiece, and the pneumatic slider is connected with the energy converter shell and the amplitude transformer through the pneumatic slider connection frame. By means of the ultrasonic and micro-forging composite device, the advantages that ultrasonic impact frequency is high and deformation generated by mechanical rolling is large are combined, the composite effect of ultrasonic impact and continuous rolling micro-forging can be achieved, and the purpose of improving the microstructure of the additively manufactured metal and the mechanical performance of parts is achieved. Through organic combination of the ultrasonic and micro-forging composite device and the additive manufacturing method with an existing additive manufacturing technology, the technical bottleneck that structure control is easy while performance control is difficult in existing metal additive manufacturing is solved, and innovation and development of metal rapid forming and manufacturing technologies are induced.
Owner:HARBIN ENG UNIV +1

Run to run control process for controlling critical dimensions

It has been discovered that all causes of critical dimension variation, both known and unknown, are compensated by adjusting the time of photoresist etch. Accordingly, a control method employs a control system using photoresist etch time as a manipulated variable in either a feedforward or a feedback control configuration to control critical dimension variation during semiconductor fabrication. By controlling critical dimensions through the adjustment of photoresist etch time, many advantages are achieved including a reduced lot-to-lot variation, an increased yield, and increased speed of the fabricated circuits. In one embodiment these advantages are achieved for polysilicon gate critical dimension control in microprocessor circuits. Polysilicon gate linewidth variability is reduced using a control method using either feedforward and feedback or feedback alone. In some embodiments, feedback control is implemented for controlling critical dimensions using photoresist each time as a manipulated variable. In an alternative embodiment, critical dimensions are controlled using RF power as a manipulated variable. A run-to-run control technique is used to drive the critical dimensions of integrated circuits to a set specification. In a run-to-run control technique a wafer test or measurement is made and a process control recipe is adjusted based on the result of the test or measurement on a run-by-run basis. The run-to-run control technique is applied to drive the critical dimensions of a polysilicon gate structure to a target specification. The run-to-run control technique is applied to drive the critical dimensions in an integrated circuit to a defined specification using photoresist etch time as a manipulated variable.
Owner:LONE STAR SILICON INNOVATIONS LLC
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