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Temperable LOW-E glass and preparation method thereof

A glass and glass matrix technology, applied in the field of temperable LOW-E glass and its preparation, can solve the problems of large color changes and achieve the effect of ensuring consistency

Pending Publication Date: 2019-09-17
吴江南玻华东工程玻璃有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The invention provides a temperable LOW-E glass, which solves the problem of large color change of the existing temperable Low-E glass before and after tempering

Method used

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  • Temperable LOW-E glass and preparation method thereof
  • Temperable LOW-E glass and preparation method thereof
  • Temperable LOW-E glass and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] The structure of the composite film layer 200 on the surface of the glass substrate 100 in this example is: SiNx layer / TiOx layer / ZnOx layer / Ag layer / NiCr layer / AZO layer / SiNx layer / NiCr layer / SiNx layer / ZnOx layer / Ag layer / NiCr layer / AZO layer / SiNx layer.

[0034] The thickness of each film layer in the composite film layer 200 is 34.2nm / 9.8nm / 15.2nm / 9.2nm / 1.8nm / 8.9nm / 29.3nm / 1.1nm / 33.7nm / 15.0nm / 10.1nm / 1.3nm / 9.2nm nm / 27.4nm.

[0035] The preparation method of temperable LOW-E glass in this embodiment is as follows:

[0036] 1. The first dielectric layer 201 is plated on the glass substrate 100 by magnetron sputtering process: under the control of an intermediate frequency AC power supply, the silicon target is sputtered in a mixed atmosphere of argon and nitrogen (Ar:N2=9:7) Spray deposition, the first dielectric layer with a film thickness of 34.2nm is a SiNx layer;

[0037] 2. Coating the transition layer 202 on the first dielectric layer by magnetron sputtering: U...

Embodiment 2

[0060] The structure of the composite film layer 200 on the surface of the glass substrate 100 in this example is: SiNx layer / TiOx layer / ZnOx layer / Ag layer / NiCr layer / AZO layer / SiNx layer / NiCr layer / SiNx layer / ZnOx layer / Ag layer / NiCr layer / AZO layer / SiNxOy layer.

[0061] The thickness of each film layer in the composite film layer 200 is 29.7nm / 4.6nm / 14.8nm / 7.1nm / 1.8nm / 8.8nm / 30.8nm / 1.3nm / 34.3nm / 15.9nm / 9.8nm / 1.3nm / 9.3nm nm / 25.6nm.

[0062] The preparation method of temperable LOW-E glass in this embodiment is as follows:

[0063] 1. The first dielectric layer 201 is plated on the glass substrate 100 by magnetron sputtering process: under the control of an intermediate frequency AC power supply, the silicon target is sputtered in a mixed atmosphere of argon and nitrogen (Ar:N2=9:7) Spray deposition, depositing a first dielectric layer 201 (SiNx layer) with a film thickness of 29.7 nm;

[0064] 2. Using the magnetron sputtering process, the transition layer 202 is plated on...

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Abstract

The invention relates to the technical field of glass production and specifically relates to temperable LOW-E glass comprising a glass matrix and a composite film layer plated on the surface of one side of the glass matrix; the composite film layer comprises a first medium layer, a transition layer, a first seed layer, a first functional layer, a first protective layer, a first AZO layer, a second medium layer, a sandwich layer, a third medium layer, a second seed layer, a second functional layer, a second protective layer, a second AZO layer and a fourth medium layer which are hence deposited outwards from the glass matrix, and the sandwich layer is an NiCr layer. One sandwich layer is additionally arranged in the medium layer between the functional layers of the temperable LOW-E glass, the sandwich layer is the NiCr layer, and the temperable LOW-E glass is provided with the sandwich layer, so that the color before the temperable LOW-E glass is tempered and the color after the temperable LOW-E glass is tempered are basically kept consistent.

Description

technical field [0001] The invention relates to the technical field of glass production, in particular to a temperable LOW-E glass and a preparation method thereof. Background technique [0002] LOW-E glass is mostly used in windows, such as insulating glass (IG) window units, etc. As we all know, in some cases, in order to make the glass achieve high strength, bending, etc., it is necessary to temper this energy-saving glass. During tempering, the coated glass needs to be heated to a temperature of around 620°C, and then cooled at a high rate to generate internal stress to make the glass have higher strength. This high temperature treatment will lead to different processes in the film layer (such as oxidation, recrystallization, diffusion, volume change, stress increase or relaxation, etc.), most of these processes will change the color value of energy-saving glass. At present, there is a lack of LOW-E glass with less color difference before and after tempering on the m...

Claims

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Application Information

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IPC IPC(8): C03C17/36
CPCC03C17/36C03C17/3618C03C17/3639C03C17/3652C03C17/366C03C2218/154
Inventor 梁干唐晶武瑞军戴颖
Owner 吴江南玻华东工程玻璃有限公司
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