BaZr0.35Ti0.65O3 epitaxial thin film and preparation method thereof
A bazr0.35ti0.65o3, epitaxial thin film technology, applied in ion implantation plating, metal material coating process, coating and other directions, can solve the problem of inability to large energy storage density, achieve excellent thermal stability, high energy storage Effects of density and energy storage efficiency, high insulation
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[0036] The present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments.
[0037] BaZr of the present invention 0.35 Ti 0.65 o 3 The epitaxial film is a lead-free epitaxial film with high breakdown field strength and excellent wide-temperature energy storage characteristics. It is also a lead-free epitaxial film of the BZT system. The preparation method is as follows:
[0038] (1) First, according to the chemical formula BaZr 0.35 Ti 0.65 o 3 (i.e. BZT) and doped with 1% SiO 2 BaZr 0.35 Ti 0.65 o 3 (i.e. SiO 2 : BZT, in mass percent, BaZr 0.35 Ti 0.65 o 3 Medium SiO 2 The doping amount is 1%) to weigh an appropriate amount of 4-5N grade BaCO 3 High purity powder, ZrO 2 High purity powder, TiO 2 and SiO 2 High-purity powder, the mixture of the above four high-purity powders is subjected to ball milling, pre-sintering, granulation, molding and sintering processes, and is prepared into BZT ceramic targe...
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