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Cleaning agent and method for developing solution filter

A cleaning agent and filter technology, applied in chemical instruments and methods, semi-permeable membrane separation, membrane technology, etc., can solve problems such as unsatisfactory cleaning effect, improve purification effect, improve flushing effect, and increase swelling and looseness Effect

Active Publication Date: 2019-10-11
DONGGUAN DONGYUAN ENVIRONMENTAL TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the cleaning effect of the above method is still not ideal.

Method used

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  • Cleaning agent and method for developing solution filter
  • Cleaning agent and method for developing solution filter

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] A cleaning agent for developer filter, including cleaning agent A and cleaning agent B;

[0040] The cleaning agent A comprises the following components: H 2 SO 4 2wt%, H 2 o 2 2wt‰, the balance is water;

[0041] The cleaning agent B includes the following components: NaClO 4wt%, sodium dodecylbenzene sulfonate 2wt‰, disodium edetate 1wt‰, and the balance is water.

[0042] A cleaning method for a developing solution filter as described above, comprising the steps of:

[0043] (1) One-time water washing: rinse the filter assembly with clean water, and then drain the water;

[0044] (2) Pickling: Use cleaning agent A to carry out forward flushing on the filter assembly, then carry out heating and soaking treatment, and finally carry out reverse flushing;

[0045] (3) Secondary water washing: empty the cleaning agent A in step (2), then use clear water to rinse the filter assembly, and then empty the water;

[0046] (4) Alkaline cleaning: use cleaning agent B to c...

Embodiment 2

[0054] A cleaning agent for developer filter, including cleaning agent A and cleaning agent B;

[0055] The cleaning agent A comprises the following components: H 2 SO 4 1wt%, H 2 o 2 3wt‰, the balance is water;

[0056] The cleaning agent B includes the following components: NaClO 3wt%, sodium dodecylbenzenesulfonate 3wt‰, disodium edetate 1.5wt‰, and the balance is water.

[0057] A cleaning method for a developing solution filter as described above, comprising the steps of:

[0058] (1) One-time water washing: rinse the filter assembly with clean water, and then drain the water;

[0059] (2) Pickling: Use cleaning agent A to carry out forward flushing on the filter assembly, then carry out heating and soaking treatment, and finally carry out reverse flushing;

[0060] (3) Secondary water washing: empty the cleaning agent A in step (2), then use clear water to rinse the filter assembly, and then empty the water;

[0061] (4) Alkaline cleaning: use cleaning agent B to ...

Embodiment 3

[0069] A cleaning agent for developer filter, including cleaning agent A and cleaning agent B;

[0070] The cleaning agent A comprises the following components: H 2 SO 4 3wt%, H 2 o 2 1wt‰, the balance is water;

[0071] The cleaning agent B includes the following components: NaClO 5wt%, sodium dodecylbenzenesulfonate 1wt‰, disodium edetate 0.5wt‰, and the balance is water.

[0072] A cleaning method for a developing solution filter as described above, comprising the steps of:

[0073] (1) One-time water washing: rinse the filter assembly with clean water, and then drain the water;

[0074] (2) Pickling: Use cleaning agent A to carry out forward flushing on the filter assembly, then carry out heating and soaking treatment, and finally carry out reverse flushing;

[0075] (3) Secondary water washing: empty the cleaning agent A in step (2), then use clear water to rinse the filter assembly, and then empty the water;

[0076] (4) Alkaline cleaning: use cleaning agent B to ...

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Abstract

The invention relates to the technical field of filter cleaning, in particular to a cleaning agent and method for a developing solution filter. According to the method, in the acid pickling process, micelle impurities can be shrunk, gaps between the micelle impurities and filtering pores get large, the permeation of a cleaning agent A and a subsequent cleaning agent B is facilitated, and membranemicropores are more fully flushed; meanwhile, through temperature-rising soaking of the cleaning agent A, the oxidation function of hydrogen peroxide can be improved, the micelle impurities are oxidized into smaller particles, and therefore the situation is avoided that the micelle impurities are hardened and attached to the walls of the filtering pores; in the alkali cleaning process, under the condition that a small quantity of small particles obtained after acid pickling are left on a ceramic membrane, the colloidal particles can be expanded, the contact area between the colloidal particlesand water flow is increased accordingly, and the flushing effect is improved; in addition, under the functions of NaClO, sodium dodecylbenzene sulfonate, ethylenediamine tetraacetic acid disodium andtemperature-rising soaking, the expanded colloidal particles cannot be agglomerated, and through backflushing operation, the membrane flux of the colloidal particles can be easily restored.

Description

technical field [0001] The invention relates to the technical field of filter cleaning, in particular to a cleaning agent and a cleaning method for a developing solution filter. Background technique [0002] The general composition of PCB dry film developer is Metol, hydroquinone, sodium carbonate, sodium hypochlorite and water. The main purpose of using a developer is to remove the bridged ink that has not been exposed to UV light. The reaction formula of ink chemical structure during developing process is: [0003] [0004] It can be seen from the chemical structural reaction formula that sodium bicarbonate and resin micelles impurities are generated after development. Therefore, when the ceramic membrane is filtered, the sodium bicarbonate is reused, and the resin micelles and other inorganic dirt are trapped, and with the use of the ceramic membrane, the resin micelles and other inorganic dirt gradually foul the membrane pores. [0005] In order to restore the flux...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D65/06
CPCB01D65/02B01D2321/162B01D2321/164B01D2321/04
Inventor 肖应东肖勇辉徐蓉珊赖辉
Owner DONGGUAN DONGYUAN ENVIRONMENTAL TECH CO LTD