Device and method for measuring optical constant and morphology parameters of thin film under high temperature loading

Abstract

The invention belongs to the related technical field of optical measurement, and specifically discloses a device and a method for measuring an optical constant and a morphology parameters of a thin film under high temperature loading. The device comprises an optical constant measuring module and a high temperature heating module, wherein the high temperature heating module comprises a high temperature heating chamber, a quartz glass window, a high temperature heating stage, a high temperature stage controller and a gas flow channel unit, and the optical constant measuring module comprises an incident light path unit and a reflection light path unit. The method comprises the steps of: acquiring an actual ellipsometric parameter of a sample according to a calibrated ellipsometric parameter,and acquiring an optical constant and a morphology parameter of the sample according to an optical constant parametric model and a forward optical model of the sample. The device and the method can calibrate the ellipsometric parameter deviation introduced by means of the quartz glass window at different heating temperatures in a wide range of thermal temperatures, and construct a reductive measuring gas atmosphere, so that the device disclosed by the invention can measure to obtain the optical constant and the morphology parameter of the sample to be tested more precisely.

Description

technical field [0001] The invention belongs to the technical field of optical measurement, and more specifically relates to a device and method for measuring optical constants and shape parameters of thin films under high-temperature loading. Background technique [0002] The optical constant of a material at high temperature is an important physical parameter to measure the response characteristics of a material to high temperature loading. In view of the increasing application of materials under high-temperature loading conditions, such as the use of plasmonic structures in thermal fields, high-energy ultrashort pulse laser energy for target deposition, high-temperature sensing units made of fiber gratings, and engineering material design in the aerospace field Thermal radiation control devices, etc., and these application scenarios require the optical constant of the material when it is loaded at high temperature. In addition, using the high-temperature optical constant...

AI Technical Summary

Problems solved by technology

This method directly ignores the deviation of ellipsometric parameters introduced by the quartz glass window, and does not consider the possible oxidation of the sample during the heating process, and the maximum heating temperature it can achieve is low, which is difficult to meet the requirements of material optics under common high-temperature loading conditions. Attribute Measurement Requirements

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