An after-sun repair anti-allergic mask for outdoor cross-country and preparation method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- 苏州榭睿迦医疗科技发展有限公司
- Publication Date
- 2021-04-13
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Abstract
Description
technical field
[0001] The invention belongs to the technical field of daily chemical products, and in particular relates to an after-sun repairing anti-allergy facial mask for outdoor off-roading and a preparation method thereof. Background technique
[0002] Outdoor trail running is a very popular sport nowadays. Many people will choose to participate in long-distance trail running when challenging their physical limits, which can test their physical fitness and endurance. Sunburn should be a problem that most outdoor trail running enthusiasts have encountered. In mild cases, the skin becomes red, with obvious sun marks, accompanied by a burning sensation; The probability of the immune system, and even shock, induce various skin diseases and even skin cancer. Many scientific experiments have proved that even in cloudy days, the irradiation rate of ultraviolet rays is 81%-95% of that in sunny days, and even in rainy days, there are 21%-54% of ultraviolet rays. When runnin...