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Multi-column spacing for photomask and reticle inspection and wafer print inspection verification

A technology of inspection area and warp, which is applied in the field of multi-column intervals, and can solve the problem of increased time

Active Publication Date: 2022-01-28
KLA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, if multiple electro-optical columns are spaced such that the total inspection area of ​​all columns is larger than the full field area of ​​the photomask / reticle, the amount of time required to inspect the full field area increases because the field area The columns must inspect a larger surface area to compensate for the non-inspected columns outside the field area

Method used

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  • Multi-column spacing for photomask and reticle inspection and wafer print inspection verification
  • Multi-column spacing for photomask and reticle inspection and wafer print inspection verification
  • Multi-column spacing for photomask and reticle inspection and wafer print inspection verification

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Embodiment Construction

[0039] Reference will now be made in detail to the disclosed subject matter which is illustrated in the accompanying drawings.

[0040] general reference Figures 1A to 7E , in accordance with one or more embodiments of the present invention, a multi-column spacer for photomask / reticle inspection and wafer printing inspection verification is described.

[0041] Embodiments of the present invention are directed to a multi-column spacer for photomask / reticle inspection and wafer printing inspection verification. Embodiments of the present invention are also directed to a method of determining column spacing for photomask / reticle inspection and wafer printing inspection verification. Embodiments of the invention are also directed to characterization tools and characterization systems configured with multiple columns of spacing for photomask / reticle inspection and wafer print inspection verification.

[0042] Figures 1A to 1C General Illustration A simplified block diagram dep...

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Abstract

The present invention discloses a multi-column assembly for a scanning electron microscope SEM system. The multi-column assembly includes a plurality of electro-optical columns arranged in an array defined by one or more intervals. Each electro-optical column includes one or more electro-optical elements. The plurality of electron optical columns are configured to characterize one or more fields on a surface of a sample immobilized on a stage. A number of electron-optical columns in the plurality of electron-optical columns is equal to an integer number of inspection regions in a field region of the one or more field regions. The one or more spacings of the plurality of electro-optical columns correspond to one or more dimensions of the inspection zone.

Description

[0001] Cross References to Related Applications [0002] This application asserts the benefit under 35 U.S.C. §119(e) of U.S. Provisional Patent Application Serial No. 62 / 454,807, filed February 5, 2017, and entitled "For OPTIMUM MULTI-COLUMN PITCH SPACINGFOR MASK INSPECTION AND WAFER LAYOUT FOR PRINT CHECK VERIFICATION" by Robert Haynes, Frank Frank Chilese and Moshe Preil, said US Provisional Patent Application is hereby incorporated by reference in its entirety. technical field [0003] The present invention relates generally to photomask / reticle and wafer inspection and re-inspection, and more particularly, to a multi-column bay for photomask / reticle inspection and wafer print inspection verification. Background technique [0004] The fabrication of semiconductor devices, such as logic devices and memory devices, typically includes processing the semiconductor device using a number of semiconductor fabrication and metrology processes to form the various features and la...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F9/00G03F7/20
CPCH01L22/12G03F1/86H01J37/28H01J2237/2817H01J2237/30438H01J2237/30433H01J37/3045H01J37/06H01J2237/24475G03F9/7061H01J37/244G03F7/70958H01J2237/2814H01J37/20G03F7/70483H01J2237/2448G03F7/70655G03F7/706849H01J37/261
Inventor R·海恩斯F·基莱塞M·普里尔
Owner KLA CORP