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Semiconductor Processing Equipment

A technology for processing equipment and semiconductors, which is applied in semiconductor/solid-state device manufacturing, metal material coating process, coating, etc. It can solve the problems of smoke from the furnace door, black edges of sheet materials, and large size, and achieve flexible adjustment. and control effects

Active Publication Date: 2020-12-08
LAPLACE RENEWABLE ENERGY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003]The following problems exist in the current equipment: graphite boats are usually large in size, and generally can reach about 2 meters if placed horizontally, and the electric field is transmitted from the tail of the entire graphite boat to the front There will be great differences in the parts, and it is difficult to obtain a uniform electric field
Since the sheet material needs to be placed vertically, the surface of the sheet material and the surface of the graphite boat will not be tightly bonded, resulting in poor electrical conductivity of the sheet material. Black edges are produced, and there is a risk of rewinding, resulting in an increase in the rate of defective products
[0004] Moreover, the furnace door of the corresponding existing equipment is sealed by the way that the sealing plate is in contact with the furnace frame, and the sealing plate is a buckle type, that is, the sealing plate passes through The buckle is fixed on the furnace door. When the furnace door is not tightly sealed, the operator pushes the sealing plate forward to seal by tapping the buckle. However, after a long period of use, the position where the sealing plate contacts the furnace frame is severely worn. When the furnace door and the furnace frame are sealed by the sealing plate, the seal will not be tight, which will cause smoke from the furnace door, affect the environmental sanitation, and also have a serious impact on the economic and social benefits of the enterprise

Method used

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Embodiment

[0038] Such as Figure 1 to Figure 6 As shown, the semiconductor processing equipment includes a furnace body 1, a furnace door 2, and an electrode structure is arranged on the furnace door 2. The electrode structure includes an electrode column 3-7, an electrode body 3-5 and an insulating material. The electrode column 3-7 is connected with the electrode main body 3-5, and the insulating material covers the side of the electrode column 3-7. By insulating and covering the electrode columns, only two ends of the electrode columns 3-7 are exposed. It will be more convenient when the furnace door 2 is connected to the electrode structure in the graphite boat, and it will be easier to form a uniform electric field and realize plasma-enhanced chemical vapor phase. deposition. Such as figure 1As shown, the graphite boat will be placed in parallel in the furnace body 1, and the silicon wafers on the graphite boat will also be placed in parallel. This placement structure has higher...

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Abstract

The invention discloses semiconductor processing equipment, which comprises a furnace body and a furnace door. An electrode structure is arranged on the furnace door, and an adjustment structure is arranged on the furnace door. It is connected with the furnace door through a knob; the axial direction of the adjustment device body is non-parallel to the axial direction of the knob; the invention provides a simple structure, reasonable design of the electrode mechanism, and perfect combination with the furnace door to realize the vertical placement of the graphite boat , and can quickly adjust the furnace door to achieve semiconductor processing equipment with good sealing effect.

Description

technical field [0001] The invention relates to the field of semiconductor or photovoltaic material processing, more specifically, it relates to a semiconductor processing equipment. Background technique [0002] Semiconductor or photovoltaic materials are widely used in electronics, new energy and other industries. Semiconductor and photovoltaic materials usually require chemical treatment before they can be applied to products. CVD technology is one of the processing methods. CVD is chemical vapor deposition. CVD technology is currently It has been widely used in the processing of semiconductor or photovoltaic materials. Common processing equipment includes PECVD, LPCVD, APCVD, etc. In addition to CVD, there are also diffusion processes, such as phosphorus diffusion, boron diffusion, etc., which can use gas diffusion to treat raw materials. Processing. At present, there are many related equipment in the industry. The corresponding equipment can be selected for processing a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67H01L21/223C23C16/44
CPCH01L21/67011H01L21/223C23C16/44C23C16/4409
Inventor 林佳继徐栋刘群朱太荣林依婷
Owner LAPLACE RENEWABLE ENERGY TECH CO LTD
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