A kind of deplating process of panel glass electroplating film layer
A panel glass and film layer technology, applied in the field of film treatment, can solve problems such as non-recyclable and glass bending
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Embodiment 1
[0080] In this embodiment, one side of the panel glass used is coated with PVD film and ink layer, and the other side is coated with FGAR film; the composition of FGAR is SiO 2 and Si 3 N 4 , SiO 2 Primer, SiO 2 and Si 3 N 4 Alternate plating, thickness 300nm; PVD composition is SiO 2 、Si 3 N 4 and H 4 Si, SiO 2 Primer, SiO 2 、Si 3 N 4 and H 4 Alternate plating of Si with a thickness of 3000 nm
[0081] Immerse the panel glass in the stripping solution A in a water bath at 95±3°C for 60 minutes;
[0082] Stripping solution A: potassium hydroxide 12%, tetrahydrofurfuryl alcohol 8%, ethylenediaminetetraacetic acid 5%, sodium metasilicate pentahydrate 2%, hydroxyethylidene diphosphate 8%, triethanolamine 8%, alkyl glycoside (APG) 0.3%, isooctyl ether phosphate 0.3%, and the balance is water.
[0083] Then immerse in stripping solution B, water bath 95±3℃, time 60min;
[0084] Stripping solution B: potassium hydroxide 25%, sodium gluconate 4%, sodium citrate 4%, t...
Embodiment 2
[0090] In this embodiment, one side of the panel glass used is coated with PVD film and ink layer, and the other side is coated with FGAR film; the composition of FGAR is SiO 2 and Si 3 N 4 , SiO 2 Primer, SiO 2 and Si 3 N 4 Alternate plating, thickness 300nm; PVD composition is SiO 2 、Si 3 N 4 and H 4 Si, SiO 2 Primer, SiO 2 、Si 3 N 4 and H 4 Alternate electroplating of Si with a thickness of 3000 nm;
[0091] Immerse the panel glass in the stripping solution A in a water bath at 95±3°C for 60 minutes;
[0092] Deplating solution A: Potassium hydroxide 11%, tetrahydrofurfuryl alcohol 6%, ethylenediaminetetraacetic acid 6%, sodium metasilicate pentahydrate 3%, hydroxyethylidene diphosphate 6%, triethanolamine 8%, alkyl glycoside (APG) 0.3%, isooctyl ether phosphate 0.3%, and the balance is water.
[0093] Then immerse in stripping solution B, water bath 95±3℃, time 60min;
[0094] Deplating solution B: potassium hydroxide 20%, sodium gluconate 4%, sodium citra...
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