Height adjustment equipment for quartz crucible in single crystal furnace of semiconductor device

Abstract

The invention relates to the technical field of semiconductor production equipment, in particular to height adjustment equipment for a quartz crucible in a single crystal furnace of a semiconductor device. The equipment includes a lifting mechanism, a driving mechanism, a liquid level detection module, a fixing device and a stroke controlling device which are installed in the single crystal furnace; the lifting mechanism includes lifting screw rods, internally threaded pipes that cooperate with the lifting screw rods and synchronous gears that cooperate with the internally threaded pipes; fourthrough holes are uniformly arranged in the bottom center of the single crystal furnace, a square is formed among the four through holes, a high-temperature-resistant bearing is installed in each through hole, the middle parts of the four internally threaded pipes are fixedly installed in the corresponding high-temperature-resistant bearings, and each bearing is used as a boundary, the upper endof each internally threaded pipe is located in the single crystal furnace, and the lower end is located outside the single crystal furnace; each lifting screw rod is installed in one corresponding internally threaded pipe in a screw fit manner, and the upper ends of the lifting screw rods are fixedly connected with the bottom of the fixing device; and the four synchronous gears are respectively installed on the lower ends of the corresponding internally threaded pipes. The height adjustment equipment can facilitate taking out monocrystalline silicon.

Description

technical field [0001] The invention relates to the technical field of semiconductor production equipment, and specifically relates to a height adjustment device for a quartz crucible in a single crystal furnace of semiconductor equipment. Background technique [0002] As an important processing equipment in semiconductor production equipment, single crystal furnace includes quartz crucible as an important processing part of single crystal silicon, but in the existing single crystal furnace, the quartz crucible cannot be fixed in the single crystal furnace. Therefore, when there is less liquid in the quartz crucible, the precipitated single crystal silicon is located at a lower position in the single crystal furnace, which makes it difficult to take out the single crystal silicon, reduces production efficiency, and the operation steps are cumbersome. Contents of the invention [0003] The object of the present invention is to provide a height adjustment device for the quar...

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Problems solved by technology

[0003] The object of the present invention is to provide a height adjustment device for the quartz crucible in the single crystal furnace of semiconductor equipment, so as to solve the problem of low precipitation efficiency and difficult removal of single crystal silicon in the single crystal furnace in the prior art

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