Aluminum-gallium-nitrogen-based ultraviolet LED epitaxial structure and ultraviolet LED lamp

An epitaxial structure, aluminum gallium nitride technology, applied in lampshade, lighting and heating equipment, electrical components, etc., can solve the problem of low quantum rate in ultraviolet LED epitaxial wafer, low luminous power of ultraviolet LED epitaxial wafer, electron leakage of light-emitting layer, etc. question

Inactive Publication Date: 2019-12-20
UNILUMIN GRP
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0003] However, due to the strong spontaneous and piezoelectric polarization between III-nitride materials, a strong polarization electric field is generated, which eventually leads to the leakage of electrons in the light-emitting layer, which reduces the radiative recombination efficiency of electrons and holes in the light-emitting layer. As a result, the internal quantum rate of the light emitted by the UV LED epitaxial wafer is low, which in turn causes the luminous power of the UV LED epitaxial wafer to be low.

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  • Aluminum-gallium-nitrogen-based ultraviolet LED epitaxial structure and ultraviolet LED lamp

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Embodiment Construction

[0017] In order to facilitate the understanding of the present invention, the present invention will be described more fully below with reference to the associated drawings. Preferred embodiments of the invention are shown in the accompanying drawings. However, the present invention can be embodied in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the present invention more thorough and comprehensive.

[0018] It should be noted that when an element is referred to as being “disposed on” another element, it may be directly on the other element or there may also be an intervening element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," and similar expressions are used herein for purposes of ...

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Abstract

The invention relates to an aluminum-gallium-nitrogen-based ultraviolet LED epitaxial structure and an ultraviolet LED lamp. The aluminum-gallium-nitrogen-based ultraviolet LED epitaxial structure comprises a substrate, a buffer layer, a first aluminum-gallium-nitrogen layer, a light-emitting layer and a second aluminum-gallium-nitrogen layer which are sequentially arranged in a stacked mode. Thesecond aluminum-gallium-nitrogen layer comprises a plurality of second aluminum-gallium-nitrogen sub-layers which are sequentially stacked, the aluminum components of the plurality of second aluminum-gallium-nitrogen sub-layers are different, and the aluminum components of second aluminum-gallium-nitrogen sub-layers connected with the light-emitting layer are greater than that of other second aluminum-gallium-nitrogen sub-layers. An aluminum component of a second aluminum-gallium-nitrogen sub-layer close to the light-emitting layer is maximum, an aluminum component of a second aluminum-gallium-nitrogen sub-layer away from the light-emitting layer is minimum, a built-in electric field of the second aluminum-gallium-nitrogen layer is weakened by the second aluminum gallium nitride sub-layerswith different components such that the piezoelectric polarization effect between the second aluminum-gallium-nitrogen layer and the light-emitting layer is weakened, the effective injection rate ofholes is improved, the radiative recombination rate of electrons and the holes is improved, and the internal quantum rate and the light-emitting rate of the aluminum-gallium-nitrogen-based ultravioletLED epitaxial structure are improved.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to an aluminum gallium nitrogen-based ultraviolet LED epitaxial structure and an ultraviolet LED lamp. Background technique [0002] With the continuous development of light emitting diode (Light Emitting Diode, LED) technology, ultraviolet light emitting diodes are becoming more and more important in the commercial field, and have great application value. Moreover, compared with the traditional ultraviolet light source mercury lamp, ultraviolet LED has the advantages of super long life, no heat radiation, high energy, uniform irradiation, high efficiency, small size and no toxic substances, which makes ultraviolet LED the most likely Replace the traditional UV light source. Therefore, UV LEDs are receiving more and more attention from researchers. Among them, the luminous power of the ultraviolet LED is related to the internal quantum rate of the light emitted by the ultra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/32H01L33/12H01L33/00F21K9/20F21V21/02F21V3/00F21Y115/10
CPCF21K9/20F21V3/00F21V21/02F21Y2115/10H01L33/0075H01L33/12H01L33/325
Inventor 李光郑悠白耀平
Owner UNILUMIN GRP
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