Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Three-dimensional displacement measurement system and measurement method based on laser self-mixing grating interference

A technology of displacement measurement and grating interference, which is applied in the direction of measuring devices, optical devices, instruments, etc., can solve problems such as limited range, achieve the effects of improving measurement resolution, simple algorithm, and reducing system cost

Active Publication Date: 2021-04-06
NANJING NORMAL UNIVERSITY
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Purpose of the invention: The technical problem to be solved by the present invention is to provide a three-dimensional displacement measurement system and measurement method based on laser self-mixing grating interference, which solves the problem of limited range of traditional grating interferometers in out-of-plane displacement measurement, and at the same time compared with traditional The grating interferometer is more compact and maintains the advantages of self-collimation of the laser self-mixing interferometer, which can realize a simple structure, large range, high-resolution three-dimensional real-time displacement measurement system and measurement method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Three-dimensional displacement measurement system and measurement method based on laser self-mixing grating interference
  • Three-dimensional displacement measurement system and measurement method based on laser self-mixing grating interference
  • Three-dimensional displacement measurement system and measurement method based on laser self-mixing grating interference

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0030]The measurement system of the present embodiment is likefigure 1 As shown, including the first semiconductor laser sensing head 1, the second semiconductor laser sensor head 2, the third semiconductor laser sensor head 3, the reflective two-dimensional planar grating 4, the first planar mirror 5, the second plane reflection Mirror 6, data acquisition card 7 and computer 8. The first semiconductor laser sensing head 1, the second semiconductor laser sensing head 2, the third semiconductor laser sensing head 3 is perpendicular to the reflective two-dimensional planar grating 4, i.e., in the direction of the reflective two-dimensional planar grating 4 They are placed on the projection of the reflective two-dimensional planar grating 4, and the projection of the first semiconductor laser sensor head 1 is located at a vertical point of the triangle, the second semiconductor laser sensing head 2, the third semiconductor laser sensing head 3 The projection is located in the two botto...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a three-dimensional displacement measurement system and measurement method based on laser self-mixing grating interference. The system includes a semiconductor laser sensor head, a plane mirror, a reflective two-dimensional plane grating, a data acquisition card and a computer. The laser light emitted by the head is incident on the reflective two-dimensional grating, and the corresponding diffracted light is fed back to the semiconductor laser sensor head along the original optical path to generate self-mixing interference. The self-mixing interference signal is converted into an electrical signal by the built-in photodetector of the semiconductor laser, and output To the data acquisition card, after computer processing, the three-dimensional displacement of the target to be measured is obtained. The invention solves the problem of the limited range of the traditional grating interferometer when measuring the out-of-plane displacement, and is more compact than the traditional grating interferometer, and maintains the advantages of self-collimation of the laser self-mixing interferometer, and can realize simple structure, a large number of High-resolution, high-resolution three-dimensional real-time displacement measurement system and measurement method.

Description

Technical field[0001]The present invention belongs to the field of precision displacement measurement, and in particular, to a three-dimensional displacement measurement system and measurement method based on laser self-mixing grating interference.Background technique[0002]Precision displacement measurement is a key technology for advanced manufacturing development and the forefront of the entire nano-technology field. With the development of semiconductor manufacturing technology and ultrafine processing technology, the demand for real-time high-precision three-dimensional positioning system has grown rapidly. The laser interferometer and the grating interferometer are widely used in high-precision displacement measurements due to non-contact, high resolution, and wide dynamic measurement range. The laser interferometer is typically used to measure the surface displacement of the target, and its accuracy can reach the nanometer level, and the measurement range can reach tens of met...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/02
CPCG01B11/02
Inventor 郭冬梅施立恒汪弋平夏巍郝辉蔡文魁
Owner NANJING NORMAL UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products