Optical mirror, X-ray fluorescence analysis device and method for X-ray fluorescence analysis
A fluorescence analysis, X-ray technology, applied in the field of optical mirrors, can solve the problems of reduced intensity, long measurement time, plastic erosion, etc., to save space, improve evaluation and monitoring effects
Pending Publication Date: 2020-01-17
HELMUT FISCHER & INSTITUT FUR ELECTRONIK & MESSTECHN
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Problems solved by technology
However, the disadvantage of this optic is that it must be fixed at a large distance from the specimen surface in order to produce a disturbance-free image.
[0008] The disadvantage of both embodiments is that these full-surface carriers reduce the intensity of the X-ray radiation directed at the measurement object and thus require more measurement time
Additionally, an embodiment in which the carrier is made of plastic has the disadvantage that, over the course of time, the plastic is eroded by exposure to X-ray radiation
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[0042] Such as figure 1 The shown X-ray fluorescence analysis device 9 comprises an X-ray tube 10 of conventional construction with a hot cathode 12 as X-ray source, from which electrons are emitted and accelerated with an accelerating voltage U B And it is accelerated to collide with the anode 11. At the anode, electrons are braked and an X-ray beam / X-ray 13 is generated. The wavelength range of the polychromatic X-ray beam 13 depends on the accelerating voltage U B , accelerating voltage U B Typically the range is from about 10 kV, eg to 50 kV in the exemplary embodiment, and the anode material is eg tungsten.
[0043] The X-ray beam 13 is then preferably brought into focus / focus by means of the X-ray optics 14, which in the illustrated embodiment consists of a single-tube / monocapillary or multi-tube / polycapillary mirror form. Alternatively, only a simple collimator can also be used for blanking beam 19 .
[0044] The blanked or focused beam 19 then strikes the sample ...
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Abstract
The invention relates to an x-ray fluorescence analysis device, comprising an x-ray source (10) for irradiating a sample (15) with x-radiation (19), an x-ray detector (17) for measuring x-ray fluorescence radiation (16) emitted by the sample (15), and a camera (25) for producing an optical control image (26) of the irradiated measurement point (29) of a sample (15) by means of the optical mirror (20) arranged at an angle in the beam path of the x-ray source (10), which optical mirror comprises a carrier (21) having a mirror layer (28) provided on the carrier (21). In order to create an x-ray florescence device by means of which realistic control recordings of the sample to be analysed, in particular of the sampled surface point, are possible, the invention provides that the optical mirror(20) has a passage window (23) for the x-radiation (19), which is formed by an opening (23) in the carrier (21) and a foil (22) forming the mirror layer (28) and covering the opening (23) on an outersurface of the carrier (21).
Description
[0001] The patent application for this invention is the Chinese invention patent application No. 201480011675.4 (International Application No. PCT / EP2014 / 053799 ) for a divisional application. technical field [0002] The present invention relates to an optical mirror, in particular an optical mirror for an X-ray fluorescence analysis device; and to an X-ray fluorescence analysis device, wherein the X-ray fluorescence analysis device has an X-ray source for irradiating a sample with X-ray radiation, X-ray detector for measuring the X-ray fluorescence radiation emitted by the sample, and a camera, wherein the camera generates the irradiated position of the sample via optical mirrors arranged at an angle in the beam path of the X-ray source optical image. Furthermore, the invention relates to a corresponding method for X-ray fluorescence analysis, in particular for determining the thickness of thin layers. Background technique [0003] X-ray fluorescence analysis is a non-de...
Claims
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IPC IPC(8): G01N23/223
CPCG01B15/02G01N23/223G01N2223/076G01N23/2206G02B5/0808
Inventor V·勒西格
Owner HELMUT FISCHER & INSTITUT FUR ELECTRONIK & MESSTECHN