A kind of arf photoresist resin with high adhesion and preparation method thereof
A photoresist, high-adhesion technology, applied in the field of circuit manufacturing materials, can solve the problems of substrate surface residues, lithography pattern defects, affecting product yield, etc., achieve easy removal, excellent adhesion, and reduce lithography patterns The effect of defects
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Embodiment 1
[0040]This embodiment provides a kind of ArF photoresist resin, and its preparation method comprises the following steps:
[0041] (1) 30g of butyrolactone methacrylate, 50g of 2-methyl-2-adamantyl methacrylate, 15g of isobornyl methacrylate and 5g of acrylonitrile are added in a reactor filled with nitrogen, and the reaction Add 50g of ethyl acetate in the kettle, stir the reaction kettle to 77°C, then add dropwise (dropping time is 10min) the first ethyl acetate 10g and 2g of dibenzoyl peroxide in the reaction kettle The mixed solution was reacted at 77°C for 7 hours, the reaction was stopped, and the temperature of the reaction kettle was cooled to room temperature;
[0042] (2) add the first methanol of 1000g in step (1) to the reaction kettle that is lowered to room temperature, after producing precipitation 1h, export the liquid in the described reaction kettle, then add the second ethyl acetate to the described reaction kettle Precipitation dissolved;
[0043] (3) Add...
Embodiment 2
[0048] This embodiment provides a kind of ArF photoresist resin, and its preparation method comprises the following steps:
[0049] (1) 29g of butyrolactone methacrylate, 48g of cyclopentyl methacrylate, 13g of isobornyl methacrylate and 10g of acrylonitrile are added in a reactor full of nitrogen, and 50g of ethyl acetate is added in the reactor After stirring evenly, the reaction kettle was heated to 77°C, and then a mixed solution of 8g of the first ethyl acetate and 1g of dibenzoyl peroxide was added dropwise (dropping time was 10min) into the reaction kettle, and reacted at 77°C After 7 hours, the reaction was stopped, and the reactor temperature was cooled to room temperature;
[0050] (2) add the first methanol of 1000g in step (1) to the reaction kettle that is lowered to room temperature, after producing precipitation 1h, export the liquid in the described reaction kettle, then add the second ethyl acetate to the described reaction kettle Precipitation dissolved;
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