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Method for preparing unconventional-refraction-index mixed film based on magnetron sputtering

A technology of magnetron sputtering and thin film preparation, which is applied in sputtering plating, ion implantation plating, metal material coating process, etc., and can solve problems such as limited application

Active Publication Date: 2020-01-31
江苏北方湖光光电有限公司
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Problems solved by technology

The materials prepared by grazing incidence electron beam evaporation are inherently deficient in porous structure, and at the same time bring problems such as stability and durability, which limit its application.

Method used

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  • Method for preparing unconventional-refraction-index mixed film based on magnetron sputtering
  • Method for preparing unconventional-refraction-index mixed film based on magnetron sputtering
  • Method for preparing unconventional-refraction-index mixed film based on magnetron sputtering

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Embodiment Construction

[0026] In order to make the objectives, technical solutions and advantages of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0027] The invention provides a method for preparing an unconventional refractive index mixed film based on magnetron sputtering, comprising the following steps:

[0028] Step 1: Clean the cathode target and install the required targets in sequence. The required target materials are in order: the No. 2 target is a tantalum target, and the No. 3 target is a silicon target.

[0029] Step 2: Fixture treatment: In order to prevent defects such as fixture marks on the edges of the parts and fixtures, sandblasting is required for the use of fixtures.

[0030] Step 3: Put the cleaned parts to be plated into the treated coating fixture, place them in the parts tray of the coating machine, press the vacuum chamber door, and start vacuuming. Am...

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Abstract

The invention provides a method for preparing unconventional-refraction-index mixed film based on magnetron sputtering and belongs to the technical field of optical film. According to the method, a unconventional-refraction-index mixed material adopts pulse direct-current magnetron sputtering deposition, specifically, joint sputtering of a tantalum target material and silicon target material is conduced with a cathode, a radio frequency ion source is used for ionizing oxygen in the same cavity, and the tantalum target material and the silicon target material are made to jointly perform a reaction on the surface of a substrate to form the film. Since the film prepared by the adoption of magnetron sputtering has a higher structure than the film prepared through thermal evaporation, the durability and stability of the film prepared by the adoption of magnetron sputtering are excellent than the film layer deposited through thermal evaporation.

Description

technical field [0001] The invention relates to the technical field of optical films, in particular to a method for preparing an unconventional refractive index mixed film based on magnetron sputtering. Background technique [0002] At present, optical films are usually designed with different refractive index film materials, different thicknesses and arrangements, in order to achieve most of the optical films that meet specific technical requirements. Since there are not many types of coating materials available, the selectable refractive index is very limited and constant, which limits the design of optical thin films to a certain extent, and in some cases the desired spectral properties cannot be obtained. Common limitations are: the width of the transmission band in the antireflection coating, the narrowness of the reflection band in the negative filter, and the durability of the coating under harsh conditions. [0003] The unconventional refractive index film layer can...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/10C23C14/08C23C14/54
CPCC23C14/0036C23C14/10C23C14/083C23C14/54
Inventor 陆丹枫唐乾隆査家明李斯成汶韬
Owner 江苏北方湖光光电有限公司
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