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Method of Proton Displacement Damage Equivalent Based on Gated Lpnp Transistor

A technology of displacement damage and transistors, applied in the field of efficiency, can solve problems such as large limitations and inability to consider the influence of defects

Active Publication Date: 2020-10-09
NORTHWEST INST OF NUCLEAR TECH
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Problems solved by technology

[0005] Since the ionization effect produced by proton irradiation on electronic devices will have a serious impact on the displacement damage effect, there are great limitations in evaluating the degradation characteristics of semiconductor devices using conventional performance parameters; in terms of theoretical methods, widely adopted methods based on non-ionization energy loss The main consideration in the calculation method is the deposition of non-ionization energy related to the initial defect, and the influence of the subsequent annealing of the defect cannot be considered

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  • Method of Proton Displacement Damage Equivalent Based on Gated Lpnp Transistor
  • Method of Proton Displacement Damage Equivalent Based on Gated Lpnp Transistor
  • Method of Proton Displacement Damage Equivalent Based on Gated Lpnp Transistor

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Embodiment Construction

[0042] Neutron radiation will cause the displacement effect of lattice atoms in semiconductor materials, forming defects and defect groups, which is equivalent to increasing the recombination center, thereby reducing the lifetime of minority carriers in the base region of bipolar transistors and reducing the current gain of the transistors. The damage caused by ionizing radiation is negligible. The original minority carrier lifetime is τ 0 , the minority carrier lifetime after neutron radiation is τ φ , then there are:

[0043] 1 / τ φ -1 / τ 0 =Kφ n

[0044] where K is the minority carrier lifetime damage constant, which is related to the semiconductor resistivity before radiation and the incident neutron energy; φ n is the neutron fluence. Based on the above formula, as long as the minority carrier lifetime and the corresponding neutron fluence before and after neutron irradiation are measured, the minority carrier lifetime damage constant can be obtained, and according t...

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Abstract

The invention belongs to the technical field of proton displacement damage, specifically relates to a method for performing proton displacement damage equivalence based on a grid-control LPNP transistor, and solves the technical problem of an equivalence test for a proton irradiation displacement damage effect of a semiconductor device. According to the method, the surface recombination of a modulation transistor is controlled by utilizing grid voltage, the surface recombination is inhibited by utilizing a grid control method, the minority carrier lifetime is directly measured, and the equivalence between a proton displacement damage effect and 1 MeV neutron irradiation damage is realized through a functional relation between the minority carrier lifetime and 1 MeV equivalent neutron fluence. A grid-control charge separation analysis method selected by the invention can simultaneously measure a cumulative ionizing radiation total dose effect introduced by proton irradiation damage andrealize quantitative measurement on oxide charge density and interface trap density.

Description

technical field [0001] The invention relates to a method for equivalent proton displacement damage based on gate-controlled lateral structure PNP transistor charge separation technology. Background technique [0002] With the continuous development of space technology, more and more electronic devices have been used in the space radiation environment. The displacement damage effect caused by high-energy protons in the space environment will cause serious damage to the performance of electronic devices. Therefore, the equivalent analysis of proton displacement damage It is of great significance for evaluating the resistance to spatial displacement damage of electronic devices. [0003] Protons are charged particles that can simultaneously produce ionizing radiation effects and displacement damage effects in semiconductor devices. When ionization effects and displacement damage effects act on electronic devices at the same time, due to the coupling between the effects, the dis...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01R31/26
CPCG01R31/2608
Inventor 陈伟刘岩唐昭焕王忠明郭晓强王迪刘卧龙姚志斌
Owner NORTHWEST INST OF NUCLEAR TECH