Silicon-based silver nano surface enhanced substrate and preparation method thereof
A surface-enhanced, silver-nano technology, applied in measuring devices, instruments, and material analysis through optical means, can solve the problems of enhanced Raman spectrum detection with high sensitivity, weak Raman scattering signal intensity, and detection sensitivity limitations. Achieve the effects of stable substrate properties, enhanced Raman spectrum peaks, and low production costs
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[0019] A method for preparing a silicon-based silver nano-surface reinforced substrate includes the following steps:
[0020] Add sodium citrate to the boiling silver nitrate solution to obtain silver sol;
[0021] The silicon wafer is immersed in a concentrated sulfuric acid-hydrogen peroxide mixed solution, heated, kept warm, taken out and immersed in a (3-aminopropyl)trimethoxysilane solution to obtain a silicon substrate;
[0022] The silicon substrate is immersed in the silver sol.
[0023] The above method firstly uses sodium citrate heating reduction method to prepare silver sol. The specific method is: adding the sodium citrate aqueous solution dropwise to the boiling silver nitrate aqueous solution, and continue heating for 1h-2h, after the heating is completed, naturally cool to room temperature to obtain the silver sol.
[0024] Understandably, the cooled silver sol can also be centrifuged and purified, and then stored at 4°C.
[0025] At the same time, the above method also ...
Embodiment 1
[0036] This embodiment provides a silicon-based silver nano-surface reinforced substrate and a preparation method thereof, the steps are as follows:
[0037] 1. Add the sodium citrate aqueous solution dropwise to the boiling silver nitrate aqueous solution, and continue heating for 1 hour, and then cool naturally. The cooled silver sol solution was centrifuged and purified, and stored at 4°C.
[0038] 2. Cut the silicon wafer to a size of about 1cm×1cm, and place them in deionized water and absolute ethanol for 3 minutes to remove impurities on the silicon surface, and then dry them with nitrogen. Put the silicon wafers with impurities removed in the "piranha" lotion [V(H 2 SO 4 ):V(30%H 2 O 2 )=7:3], heat to 80°C and keep for 20min. During this process, a layer of hydroxyl is attached to the surface of the silicon wafer. The hydroxylated silicon wafer is immersed in a 5% mass fraction of APTMS [(3-aminopropyl)trimethoxysilane] ethanol solution, and placed for 5 hours to hydrolyze...
Embodiment 2
[0043] This embodiment provides a silicon-based silver nano-surface reinforced substrate and a preparation method thereof, the steps are as follows:
[0044] 1. Add the sodium citrate aqueous solution dropwise to the boiling silver nitrate aqueous solution, and continue heating for 30 minutes, and then cool naturally. The cooled silver sol solution was centrifuged and purified, and stored at 4°C.
[0045] 2. Cut the silicon wafer to a size of about 1cm×1cm, and place them in deionized water and absolute ethanol for 3 minutes to remove impurities on the silicon surface, and then dry them with nitrogen. Put the silicon wafers with impurities removed in the "piranha" lotion [V(H 2 SO 4 ):V(30%H 2 O 2 )=7:3], heating to 80°C and cooling at room temperature, this process attaches a layer of hydroxyl groups on the surface of the silicon wafer. The hydroxylated silicon wafer is immersed in a 5% mass fraction of APTMS[(3-aminopropyl)trimethoxysilane] ethanol solution, and placed for 2h, s...
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