Array substrate and manufacturing method thereof, and display device
An array substrate and substrate technology, applied in nonlinear optics, instruments, optics, etc., can solve problems such as the loss of display aperture ratio, achieve the effect of avoiding mutual interference of electric fields and improving quality
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Embodiment 1
[0042] This embodiment provides a method for preparing an array substrate, such as Figure 6 As shown, it includes: forming an insulating barrier 3 on the substrate 1, and the insulating barrier 3 is formed by exposing the side of the base 1 away from the insulating barrier 3; before forming the insulating barrier 3, it also includes: forming a light shielding layer 4 graphics.
[0043] In the preparation method of the array substrate, the insulating barrier 3 is formed by exposing the insulating barrier 3 from the side of the substrate 1 away from the insulating barrier 3, which can avoid the overlapping of the insulating barrier 3 and the edge of the pixel electrode 2, so that the display aperture ratio will not increase. suffer losses; by forming the pattern of the light-shielding layer 4 before forming the insulating barrier 3, it can be ensured that the pattern of the insulating barrier 3 is normally formed through back exposure, thereby avoiding the display crosstalk phe...
Embodiment 2
[0060] This embodiment provides a method for preparing an array substrate. The difference from Embodiment 1 is that, as Figure 8 As shown, the light-shielding layer is multiplexed as the pixel electrode 2 of the array substrate.
[0061] In this embodiment, the pattern of the insulating wall 3 can be formed by shielding the exposure light by the pixel electrode 2. The light-shielding layer is used as the pixel electrode 2 of the array substrate. After the light-shielding layer is prepared, it will not be removed in the subsequent process. Other steps and processes of the method for preparing the array substrate in this embodiment are the same as those in Embodiment 1, and will not be repeated here. In this embodiment, the array substrate implements display through reflection of light by the pixel electrodes 2 .
[0062] Wherein, the pixel electrode 2 is made of a light-shielding metal material. Such as aluminum, copper, molybdenum and other metals.
[0063] Based on the pr...
Embodiment 3
[0066] This embodiment provides a method for preparing an array substrate. The difference from Embodiment 1 is that, as Figure 9 As shown, the insulation barrier 3 is made of any one of silicon nitride and silicon oxide.
[0067] Wherein, the insulating wall 3 made of silicon nitride or silicon oxide is formed through the processes of exposure, development, and dry etching.
[0068] Based on the insulation retaining wall 3 formed by silicon nitride or silicon oxide materials, the preparation process is as follows:
[0069] Chemical vapor deposition on the substrate 1 after the light-shielding layer 4 is patterned forms an insulating barrier film 5, and coats a photoresist 6 on the insulating barrier film 5;
[0070] Exposing the photoresist 6 on the side of the substrate 1 away from the pixel electrode 2 to form a photoresist pattern 7;
[0071] Etching and removing the part of the insulating wall film 5 not covered by the photoresist pattern 7 to form the pattern of the in...
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