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Thermal evaporation physical vapor deposition system and use method thereof

A technology of physical vapor deposition and thermal evaporation, which is applied in vacuum evaporation plating, metal material coating process, coating, etc., can solve the problems of not having multi-dimensional quality online detection function, and achieve the elimination of off-line monitoring of film quality and saving Cost, the effect of improving the yield rate

Inactive Publication Date: 2020-05-29
WUHAN UNIV
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Problems solved by technology

[0007] The embodiment of the present application solves the problem that the physical vapor deposition coating equipment in the prior art does not have the multi-dimensional quality online detection function by providing a thermal evaporation physical vapor deposition system and its use method

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  • Thermal evaporation physical vapor deposition system and use method thereof

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Embodiment Construction

[0037] In order to better understand the above-mentioned technical solution, the above-mentioned technical solution will be described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0038] This embodiment provides a thermal evaporation physical vapor deposition system, such as figure 1 As shown, it mainly includes vacuum components and online monitoring components.

[0039] Wherein, the vacuum assembly includes a vacuum coating chamber 3 , a vacuum pump 1 , a vacuum valve 2 , a heater 5 , a substrate supporting table 6 , and a rotation driving motor 8 .

[0040] The vacuum valve 2 is installed between the vacuum pump 1 and the vacuum coating chamber 3 . The heater 5 is used to heat the crucible 4 . The substrate support table 6 is located in the vacuum coating chamber 3 and is connected to the rotation drive motor 8 , and the substrate support table 6 is used for placing a substrate 7 .

[0041] A crucible 4 is arranged i...

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Abstract

The invention belongs to the technical field of film growth, and discloses a thermal evaporation physical vapor deposition system and a use method thereof. The system comprises a vacuum assembly and an online monitoring assembly. The vacuum assembly comprises a vacuum film coating cavity. A crucible is arranged in the vacuum film coating cavity. The online monitoring assembly comprises a mass spectrometer and a nanoindentor. The mass spectrometer is used for monitoring the evaporated gas composition in real time. The nanoindentor is used for monitoring the bond strength between a coating filmand a substrate in real time. The thermal evaporation physical vapor deposition system has the multi-dimensional quality detecting function and can remarkably increase the yield of growing samples inphysical vapor deposition (PVD) and save cost.

Description

technical field [0001] The invention relates to the technical field of thin film growth, in particular to a thermal evaporation physical vapor deposition system and an application method thereof. Background technique [0002] One of the common methods of physical vapor deposition (PVD) is thermal evaporation, a form of really fast thin film deposition that can be used to apply coatings of pure materials to the surfaces of various objects. Coatings, also known as thin films, typically range in thickness from angstroms to microns and can be a single material or multiple materials in a layered structure. [0003] Materials evaporated with thermal evaporation techniques can be pure atomic elements, including metals and nonmetals, or they can be molecules such as oxides and nitrides. The object to be coated is called a substrate and can be any of a wide variety of substances that can be used in the fabrication of microelectronic devices, semiconductor wafers, battery and fuel ce...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24C23C14/54C23C14/50
CPCC23C14/24C23C14/505C23C14/542
Inventor 刘胜张磊东芳周振孙成亮吴国强
Owner WUHAN UNIV
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