Infrared Band Cut Filter and Its Application
A cut-off filter, infrared band technology, applied in the field of optical film, can solve problems such as imaging distortion
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0049] Simulation experiment data:
[0050] Infrared band cut filter structure such as figure 1 As shown, the first near-infrared reflective film 21, the transparent substrate layer 10, and the second near-infrared reflective film 22 are sequentially stacked, and the high-refractive-index material layer 201 forming a dual unit is a titanium dioxide layer with a refractive index of 2.354, and the low-refractive The refractive index material layer 202 is a silicon dioxide layer with a refractive index of 1.46. top-down:
[0051] The first film stack A in the first near-infrared reflective film 21 θ1 The monitoring wavelength is….nm, the center wavelength is….nm, V θ1 is..., which represents the adjustment factor of the optical thickness of the dual unit in the corresponding film stack relative to the preset monitoring wavelength. H1.808L 1.777H 1.806L 1.781H 1.794L 1.787H 1.802L 1.777H 1.805L 1.789H 1.799L1.786H 1.818L 1.783H 1.824L 1.802H 1.845L 1.815H 1.892L 1.892H 1.975L ...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
refractive index | aaaaa | aaaaa |
refractive index | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com