Grain size and performance controllable sputtering target material copper plate and strip production process

Abstract

The invention relates to the technical field of copper plate and strip production processes, in particular to a grain size and performance controllable sputtering target material copper plate and strip production process. The grain size and performance controllable sputtering target material copper plate and strip production process comprises the following steps that 1, a copper blank is casted; 2, surface milling is conducted; 3, hot rolling is conducted, specifically, the copper blank is taken out of a furnace after being heated to 800-900 DEG C, the rolling process is conducted 7-11 times,and the final rolling temperature is within 600-650 DEG C; 4, on-line quenching is conducted, the temperature is rapidly controlled within 200 DEG C, and therefore it is guaranteed that the grain sizeis within 70 microns, and the hardness is within 100 HV; 5, secondary surface milling is conducted; 6, annealing is conducted; 7, surface treatment is conducted; and 8, packaging is conducted. According to the method, existing equipment is fully utilized, the content of Cu is controlled to reach the standard for high-purity oxygen-free copper of cast ingots produced through the casting, in the hot rolling production process, the grain size is controlled by controlling the heating temperature, the rolling passes, the finish rolling temperature and the rapid quenching, finally, the grain size uniformity and the physical performance meet the requirements of customers in a bell-type furnace annealing mode, the production efficiency is improved, and the product quality is also improved.

Description

technical field [0001] The invention relates to the technical field of copper strip production technology, in particular to a sputtering target copper strip production technique with controllable grain size and performance. Background technique [0002] At present, copper strip production is mainly carried out by ingot hot rolling. However, with the continuous development of industrial technology, the quality and precision requirements of copper strips are getting higher and higher, and the traditional rolling method can no longer meet the requirements of high-quality copper strips. The annealing quality in the copper strip production process is poor, the parameter setting is not ideal, and the production operation is cumbersome, so that the produced copper strip cannot meet the production requirements. [0003] Copper strips are also mostly used for targets. Due to the high requirements for target composition, grain size and physical and chemical properties, the existing t...

AI Technical Summary

Problems solved by technology

However, with the continuous development of industrial technology, the quality and precision requirements of copper strips are getting higher and higher, and the traditional rolling method can no longer meet the requirements of high-quality copper strips

The annealing quality in the copper strip production process is poor, the parameter setting is not ideal, and the production operation is cumbersome, so that the produced copper strip cannot meet the production requirements

[0003] Copper strips are also mostly used for targets. Due to the high requirements for target composition, grain size and physical and chemical properties, the existing targets are mainly produced through the production process designed by forging equipment, which requires higher requirements for blanks and forging equipment. With production, the production volume is small, and it cannot be mass-produced

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