Graphene conductive glass and preparation method, defrosting glass and electromagnetic shielding glass
A technology of conductive glass and graphene, which is applied in vacuum evaporation plating, coating, sputtering plating, etc., can solve the problems of being vulnerable to physical scratches and environmental damage, poor bonding between graphene layer and optical substrate, and achieving Effects of overcoming physical abrasion and environmental damage, improving environmental applicability, and good surface properties
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[0048] The present invention also proposes a preparation method of graphene conductive glass, which comprises the following steps:
[0049] 1) plating the first amorphous carbon film on the clean optical substrate;
[0050] 2) plating graphene film on the first amorphous carbon film;
[0051] 3) Covering part of the graphene film layer as an electrode connection area according to the design scheme; plating a second amorphous carbon film on the uncovered graphene film layer.
[0052] According to the above-mentioned process, a graphene functional layer is plated on the surface of the optical substrate. After the plating is completed, the covering covering the graphene layer is removed, and the graphene layer that is not covered by the second amorphous carbon film is connected as an electrode. The electrode is arranged in the electrode connection area and is directly connected with the graphene layer to obtain the graphene conductive glass.
[0053] Before coating the graphene...
Embodiment 1
[0070] An alkali-free glass substrate with a size of 100mm×100mm×0.5mm was selected, and a graphene functional layer was plated on its surface. The specific preparation steps are as follows:
[0071] 1) Drop the alcohol solution into the clean cloth to wipe the surface of the substrate, put the cleaned substrate into the magnetron sputtering coating machine, and use graphite as the target;
[0072] 2) Vacuum to 3×10 -3 Below Pa, pass in 30sccm of high-purity argon gas, ignite, adjust the RF power to 100W, and clean the substrate for 5min;
[0073] 3) Keep the power of 100W unchanged, keep the high-purity argon flow rate of 30sccm unchanged, and then feed methane gas of 20sccm;
[0074] 4) A 30nm thick amorphous carbon film is plated on the surface of the substrate (the thickness is controlled by the deposition time);
[0075] 5) Then, on the surface of the substrate, a single-layer graphene with a size of 110mm×110mm on the surface of the copper foil is transferred by a sta...
Embodiment 2
[0081] An infrared chalcogenide glass substrate with a size of Ф100mm×2mm was selected, and a graphene functional layer was plated on its surface. The specific preparation steps are as follows:
[0082] 1) Drop the alcohol solution into the clean cloth to wipe the surface of the substrate, put the cleaned substrate into the magnetron sputtering coating machine, and use graphite as the target;
[0083] 2) Vacuum to 3×10 -3 Below Pa, pass in 30sccm of high-purity argon gas, ignite, adjust the RF power to 100W, and clean the substrate for 5min;
[0084] 3) Keep the 100W power unchanged, keep the high-purity argon flow rate of 30sccm unchanged, and then introduce 10sccm of methane gas;
[0085] 4) A 10nm thick amorphous carbon film is plated on the surface of the substrate (the thickness is controlled by the deposition time);
[0086] 5) then utilize the spin coating method to coat the graphene conductive layer on the substrate surface;
[0087] 6) Cover the edge of the infrared...
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