A plasma discharge device and method of decomposing hydrogen sulfide
A discharge device and plasma technology, applied in the field of ion chemistry, can solve the problems of high decomposition energy consumption and low hydrogen sulfide conversion rate, etc.
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Embodiment 1
[0104] use figure 1 The shown low-temperature plasma reactor performs hydrogen sulfide decomposition reaction, and the specific structure and structural parameters of the low-temperature plasma reactor are as follows:
[0105] The reactor includes:
[0106] A first cavity, the first cavity is respectively provided with a first inlet, a gas product outlet and a liquid product outlet, wherein the side wall of the first cavity is formed by an external electrode, and forms the outer electrode The material is stainless steel metal foil, and the external electrode is grounded;
[0107] The second cavity, the second cavity is nested inside the first cavity, and the second cavity is respectively provided with a second inlet and a second outlet, and the side walls of the second cavity are all Formed by internal electrodes, the material forming the internal electrodes is stainless steel, and the internal electrodes are connected to a high-voltage power supply;
[0108] The lower edge...
Embodiment 2
[0135] The present embodiment adopts the plasma reactor similar to embodiment 1 to carry out the decomposition reaction of hydrogen sulfide, the difference is, in the present embodiment:
[0136] The external electrode is arranged on the inner side wall of the first cavity, and the external electrode is connected to a high-voltage power supply, and the material forming the external electrode is stainless steel metal foil; and the side wall of the second cavity is grounded, so that the second cavity The sidewall serves as the ground electrode.
[0137] L 2 with the thickness of the barrier dielectric D 1 ratio of 1:1; and H 1 :L 3 =1:280.
[0138] In this embodiment, H is introduced into the first cavity of the low-temperature plasma reactor from the first inlet. 2 S / Ar mixed gas, where H 2 The volume fraction of S is 30%, and the flow rate of the mixed gas is controlled so that the average residence time of the gas in the discharge area is 11.1s. In this embodiment, the ...
Embodiment 3
[0142] The present embodiment adopts the plasma reactor similar to embodiment 1 to carry out the decomposition reaction of hydrogen sulfide, the difference is, in the present embodiment:
[0143] The outer electrode is arranged around the inner side wall of the first cavity, the material forming the outer electrode is stainless steel metal foil, the outer electrode is grounded, and the inner electrode is connected to a high-voltage power supply;
[0144] L 2 with the thickness of the barrier dielectric D 1 ratio of 15:1; and H 1 :L 3 =1:400.
[0145] All the other specific structures and structural parameters are the same as in Example 1.
[0146] In this embodiment, H is introduced into the first cavity of the low-temperature plasma reactor from the first inlet. 2 S / H 2 mixed gas, where H 2 The volume fraction of S is 90%, the flow rate of the mixed gas is controlled so that the average residence time of the gas in the discharge area is 16.4s, and the reaction pressure...
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