Low-stress multilayer film optical filter and preparation method thereof

A multi-layer thin film and optical filter technology, applied in optics, optical components, instruments, etc., can solve problems that have not been solved fundamentally

Pending Publication Date: 2020-07-10
HANGZHOU KOTI OPTICAL TECH
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

So far, although the research on thin film stress has made remarkable progress, it has not been

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Low-stress multilayer film optical filter and preparation method thereof
  • Low-stress multilayer film optical filter and preparation method thereof
  • Low-stress multilayer film optical filter and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0066] As Embodiment 1, the present invention uses a conventional process to prepare a narrow-band interference filter. If the ion source is not installed on the coating equipment, the filter can only be prepared by the conventional process. The temperature of the substrate is controlled at 250°C, and a high-refractive-index film and a low-refractive-index film are alternately prepared on the substrate by using a coating device. The coating equipment uses titanium pentoxide (Ti 2 o 5 ) as the initial evaporation material of the high refractive index film, and the coating equipment uses silicon dioxide (SiO 2 ) as the initial evaporation material for low refractive index films. Since the substrate temperature is very sensitive to stress in the conventional process, the present invention attempts to make TiO 2 film and SiO 2 The purpose of the stress value of the membrane is similar and the direction is opposite. In view of the fact that the increase of substrate temperatu...

Embodiment 2

[0069] As a second embodiment, the present invention uses weak ion assistance to prepare a narrow-band interference filter. Most of the existing imported coating equipment are equipped with ion sources, because the ion assist is very sensitive to the internal stress of the film aggregation density, so the present invention attempts to realize the TiO2 by adjusting the ion assist parameters. 2 film and SiO 2 The purpose of the stress value of the film is very small and in the opposite direction. A coating device with an ion source is used to prepare a high-refractive-index film and a low-refractive-index film alternately on a substrate with weak ion assistance. Coating equipment with an ion source uses titanium pentoxide (Ti 2 o 5 ) as the initial evaporation material of the high refractive index film, and the coating equipment with ion source uses silicon dioxide (SiO 2 ) as the initial evaporation material for low refractive index films.

[0070] The present invention se...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Center wavelengthaaaaaaaaaa
Stressaaaaaaaaaa
Stressaaaaaaaaaa
Login to view more

Abstract

The invention discloses a low-stress multilayer film optical filter and a preparation method thereof, a substrate is 3.3 borosilicate glass, and the multilayer film optical filter is a double-half-wave narrow-band interference optical filter. 3.3 borosilicate glass has a linear expansion coefficient of 3.3 * 10 <-6 >/degree; in order to reduce the junction stress of the optical filter, two technologies of substrate heating and ion assistance are adopted. When the temperature of the substrate is 250 DEG C, the aggregation density of the TiO2 film is close to 1, the aggregation density of the SiO2 film is close to 0.92, and the accumulated tensile stress of the optical filter is 10.8 MPa; if the ion energy is selected to be 350 eV, the ratio JI/JM of the number of the auxiliary ions reachingthe substrate to the number of the deposited integrators is 0.15 and 0.05 respectively, so that the aggregation densities of TiO2 and SiO2 are close to 1 and 0.96 respectively, and the junction cumulative pressure stress of the optical filter is-7MPa. The low-stress film optical filter can be widely applied to various photoelectric instruments.

Description

technical field [0001] The invention relates to the field of optical films, in particular to a low-stress multilayer film filter and a preparation method thereof. Background technique [0002] The optical thin film formed by vacuum thermal evaporation or sputtering of bulk solid material usually has a great stress. Thin film stress is composed of three parts: surface tension, thermal stress and internal stress. Since the surface tension is small and the surface tension of different materials does not change much, it can be ignored. Thermal stress is caused by the difference in thermal expansion coefficient between the substrate and the film due to the temperature difference when the film is prepared and cooled to room temperature after the preparation is completed. If the thermal expansion coefficient of the substrate is not equal to the thermal expansion coefficient of the film, thermal stress must be generated, and the thermal stress usually appears as Tensile stress. I...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G02B5/28
CPCG02B5/285G02B5/28
Inventor 吴江波刘璐艾曼灵金波郑臻荣顾培夫
Owner HANGZHOU KOTI OPTICAL TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap