6results about How to "Alleviate thermal expansion coefficient differences" patented technology

The invention relates to the technical field of alloy surface coating, in particular to a high-adhesion diamond-like film coating method. The high-adhesion diamond-like film coating method comprises the following steps that an alloy base material is subjected to ultrasonic cleaning and drying, heat preservation is conducted for 1-2 h at the temperature of 160-200 DEG C in a vacuum state, plasma cleaning is conducted for 10-30 min under argon protection, and pretreated alloy is obtained; taking titanium as a target material, carrying out magnetron sputtering on the surface of the pretreated alloy to form a bottom layer, then respectively taking titanium carbide and chromium as target materials, and simultaneously carrying out magnetron sputtering on the surface of the bottom layer to form a deposition layer; keeping the vacuum degree in the vacuum cavity to be 0.2-0.6 Pa, introducing acetylene gas into the vacuum cavity, and forming a pre-deposited diamond-like carbon layer on the surface of the deposited layer by adopting an anode ion beam technology; and then the diamond-like carbon layer is placed in a filtered cathode vacuum arc device, graphite serves as a cathode target material, and the diamond-like carbon layer is formed under the conditions that the air pressure is 0.2-0.6 Pa, the current is 50-70 A and the vacuum negative bias voltage is 60-100 V.

The utility model relates to the technical field of composite metal plate, concretely relates to a kind of multi-flexibility layer metal wear-resistant lining, including substrate layer, the outside of substrate layer is sequentially provided with transition layer and wear-resistant layer according to from inside to outside, wear-resistant layer is alternately superimposed and is constituted by high-hardness layer and toughness buffer layer, the outermost layer of wear-resistant layer is high-hardness layer;High-hardness layer is high-chromium alloy or tungsten-based hard alloy;Toughness buffer layer is low alloy steel.The utility model designs wear-resistant layer as the structure of high-hardness layer and toughness buffer layer alternately superimposed, impact energy is absorbed using toughness buffer layer, crack formation is reduced under high impact working condition and crack propagation is effectively suppressed, and the wear resistance of multi-flexibility layer metal wear-resistant lining is significantly improved.

The invention belongs to the technical field of welding, and provides a nickel-based ceramic and metal connecting method and a connecting piece obtained through the nickel-based ceramic and metal connecting method. The connecting method comprises the following steps that a connecting layer is arranged between nickel-based ceramic and metal, the portion between the connecting layer and the nickel-based ceramic and the portion between the connecting layer and the metal are coated with a binding agent, then vacuum brazing is conducted, and a connecting piece of the nickel-based ceramic and the metal is obtained; the connecting layer is alloy foil, and the alloy foil comprises silver, copper, titanium and molybdenum; the nickel-based ceramic comprises boron carbide powder, titanium powder, graphite powder and nickel powder; the melting point of the metal does not exceed 2000 DEG C. According to the connecting layer, residual thermal stress caused by different thermal expansion coefficients between ceramic and metal can be relieved, interface reaction can be controlled, and the joint quality can be improved. A joint of the nickel-based ceramic and metal connecting piece is uniform and compact, and no hole or microcrack is generated; connection efficiency and connection precision are high, and material deformation is small; and the connecting joint is high in strength, high in corrosion resistance and good in conductivity.

The invention discloses a tungsten diboride-based composite nano multilayer film as well as a preparation method and application thereof. The thin film comprises a chromium transition layer and a composite nanometer multilayer structure which are sequentially arranged on the surface of a base body in a stacked mode in the thickness direction of the thin film, the composite nanometer multilayer structure comprises a plurality of periodic units arranged in a stacked mode, and each periodic unit comprises a chromium carbide nanometer layer and a tungsten diboride-carbon nanometer layer. The preparation method comprises the following steps: depositing a chromium transition layer on the surface of a substrate by adopting a magnetron sputtering technology, sequentially laminating and depositing a chromium carbide nano layer and a tungsten diboride-carbon nano layer on the chromium transition layer to form periodic units, and repeatedly preparing a plurality of periodic units to prepare the thin film. The film has the advantages of high temperature resistance, extremely low friction, strong binding force and the like, and can be applied to substrate surface protection in an extreme environment.

The invention relates to the technical field of semiconductor composite materials, and discloses a nano semiconductor composite material and a preparation method and application thereof, the nano semiconductor composite material comprises a substrate, a transition metal nitride buffer layer and a co-doped aluminum nitride single crystal film; the transition metal nitride buffer layer is deposited on the surface of one side of the substrate, and the co-doped aluminum nitride single crystal film grows on the side, away from the substrate, of the transition metal nitride buffer layer; from the whole scheme of the invention, through the synergistic effect of the component design and the process steps, the nano semiconductor composite material realizes breakthrough in multiple performance dimensions. The transition metal nitride buffer layer is combined with the co-doped structure, so that the problem that the crystallization quality and the electrical property of a traditional AlN-based material are difficult to consider at the same time is solved; through precise regulation and control of substrate pretreatment and each layer growth process, the defect problem caused by interface mismatch is effectively relieved, and the overall stability of the material is improved.

This invention relates to the field of building energy-saving materials technology, specifically to an aerogel thermal insulation and energy storage material and its preparation method. The material comprises: 5-30 wt% silica aerogel, 30-65 wt% modified expanded perlite, 10-30 wt% phenolic resin, and 20-50 wt% phase change material; and has a three-layer gradient composite structure from the outside to the inside: a surface aerogel thermal insulation layer, an intermediate interface transition layer, and a core energy storage and thermal insulation layer; the modified expanded perlite is surface-modified with γ-aminopropyltriethoxysilane, with an amino grafting amount of 0.5-1.5 mmol / g. This invention solves the interfacial compatibility and phase change leakage problems through APTES chemical bridging modification, and achieves synergistic optimization of thermal insulation and energy storage by combining the three-layer gradient structure. The material has low thermal conductivity, high energy storage density, good cycle stability, and low cost, making it suitable for large-scale applications.