DLC/CNx/MeN/CNx nano-multilayer film and preparation method thereof

A nano-multi-layer and nano-composite technology, which is applied in coating, metal material coating process, ion implantation plating, etc., can solve the problems of poor bonding strength and decreased wear resistance, and achieve reduced internal stress, low cost, The effect that the process conditions are easy to control

Active Publication Date: 2020-02-11
ZHEJIANG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In order to overcome the problem that the traditional DLC film has poor bonding strength with the base material, reducing the stress and increasing the bonding strength will lead to a decrease in wear resistance, the present invention provides a low internal stress, high bonding strength with the base material, and excellent wear resistance. Abrasive DLC / CNx / MeN / CNx nano-multilayer film

Method used

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  • DLC/CNx/MeN/CNx nano-multilayer film and preparation method thereof
  • DLC/CNx/MeN/CNx nano-multilayer film and preparation method thereof
  • DLC/CNx/MeN/CNx nano-multilayer film and preparation method thereof

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Effect test

Embodiment 1

[0044] (1) Substrate pretreatment: put the high-speed steel substrate into acetone and absolute ethanol and ultrasonically clean it for 20 minutes each to remove surface oil stains, dry it after cleaning and install it on the sample stage;

[0045] (2) Experiment preparation: put the graphite target, metal target and pretreated high-speed steel substrate into the deposition chamber of the vacuum coating machine, adjust the distance between the target material and the sample stage to 60 mm, and pump the air pressure in the deposition chamber to 1.0×10 -3 After Pa, heat the high-speed steel to stabilize the temperature at 200°C;

[0046] (3) Deposition of Cr metal transition layer: Pass high-purity argon gas into the deposition chamber, control the flow rate of argon gas to stabilize the pressure in the vacuum chamber at 0.8Pa, select Cr as the metal transition layer, and adjust the power of the pure metal Cr target to 80W , plus a negative bias of 200V, deposit a pure metal Cr...

Embodiment 2

[0054] (1) substrate pretreatment: with embodiment 1;

[0055] (2) Experimental preparation: with embodiment 1;

[0056] (3) Deposition of Ti transition layer: Introduce high-purity argon into the deposition chamber, control the flow of argon to stabilize the pressure in the vacuum chamber at 0.8Pa; adjust the power of the pure metal Ti target to 80W, plus a negative bias of 200V , deposit a pure metal Ti layer on the rotating sample stage, and the deposition time is 10min;

[0057] (4) Preparation of DLC / CNx / TiN / CNx nano-multilayer film:

[0058] a) Pass high-purity argon gas into the deposition chamber, and stabilize the pressure in the chamber at 0.8Pa, deposit a DLC layer on the Ti transition layer with a graphite target sputtering power of 60W and a negative bias voltage of 100V for 36min;

[0059] c) Deposit the first gradient CNx layer on the DLC layer with a graphite target sputtering power of 55W and a negative bias voltage of 100V, and gradually introduce high-puri...

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Abstract

The invention relates to the technical field of thin-film materials, and provides a DLC/CNx/MeN/CNx nano-multilayer film for solving the problems that the bonding strength of a traditional DLC thin film and a matrix material is poor, and the wear-resisting performance can also be reduced due to the fact that stress is reduced, and the bonding strength is improved. The DLC/CNx/MeN/CNx nano-multilayer film includes a matrix (1), and further includes a metal transition layer (2) and a nano-multilayer film which are successively deposited on the surface of the matrix, the nano-multilayer film is composed of a plurality of nano-composite units (3), and each nano-composite unit is provided with a DLC layer (4), a first gradient CNx layer (5), a metal nitride layer (6) and a second gradient CNx layer (7) which are successively arranged from bottom to top. The nano-multilayer film can effectively solve the problem of low film-matrix bonding strength of a traditional deposition method, meanwhile internal stress is reduced, and excellent wear resistance is achieved; and the steps of a preparation method are simple, process conditions are easy to control, the preparation process is safe and pollution-free, the cost is low, and industrialization is easy to realize.

Description

technical field [0001] The invention relates to the technical field of thin film materials, in particular to a DLC / CNx / MeN / CNx nanometer multilayer film and a preparation method thereof. Background technique [0002] Diamond-like Carbon (DLC) films have broad application prospects in mechanical parts, electronic devices, biomedicine and other fields due to their high hardness, good wear resistance and biocompatibility. At present, DLC film preparation techniques mainly include magnetron sputtering deposition, chemical vapor deposition, magnetic filter cathodic vacuum arc deposition, etc. However, DLC film has significant residual stress, which makes the film easy to fall off from the substrate when it is loaded. [0003] The bonding strength between the DLC film and the matrix material is poor, and a large part of the reason is that the internal stress of the film is large due to the large gap between the thermal expansion coefficients of the two. At present, the methods to...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/02C23C14/06
CPCC23C14/0036C23C14/025C23C14/0605C23C14/0641C23C14/0658C23C14/352
Inventor 杨芳儿杨烁妍郑晓华常新新
Owner ZHEJIANG UNIV OF TECH
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