Homojunction perovskite photoelectric detector and preparation method and application thereof
A photodetector and perovskite technology, applied in the field of photodetectors, can solve problems such as insufficient response speed and external quantum efficiency, inability to exert material performance, low external quantum efficiency, etc., achieve shortened response time, improved EQE value, The effect of improving the response speed
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0093] The transparent conductive substrate in the homojunction perovskite photodetector described in the present embodiment is FTO transparent conductive glass, and its square resistance is 10Ω, and transmittance is 95%; The electron transport layer comprises the TiO that thickness is 30nm 2 Dense layer and TiO with a thickness of 200nm 2 Mesoporous layer; N-type perovskite film (precursor PbX 2 and CH 3 NH 3 The molar ratio of X is 1.05:1) and the thickness is 480nm, the P-type perovskite film (PbX 2 with CH 3 NH 3 The molar ratio of X is 0.9) and the thickness is 60nm; the ratio of the thickness of the N-type perovskite film to the P-type perovskite film is 8, the metal electrode is an Au electrode, and the thickness of the gold electrode is 80nm .
[0094] The preparation method of the homojunction perovskite photodetector described in this embodiment comprises the following steps:
[0095] (1) Spin-coat a 1-butanol solution of di(acetylacetonato)diisopropyl titanat...
Embodiment 2
[0101] The transparent conductive substrate in the homojunction perovskite photodetector described in the present embodiment is FTO transparent conductive glass, and its sheet resistance is 25Ω, and transmittance is 80%; The electron transport layer comprises the TiO that thickness is 50nm 2 Dense layer and TiO with a thickness of 200nm 2 Mesoporous layer; N-type perovskite film (precursor PbX 2 and CH 3 NH 3 The molar ratio of X is 1.15:1) and the thickness is 500nm, the P-type perovskite film (precursor PbX 2 with CH 3 NH 3 The molar ratio of X is 0.92) and the thickness is 80nm, the ratio of the thickness of the N-type perovskite film to the P-type perovskite film is 6.25, the metal electrode is an Ag electrode, and the thickness of the Ag electrode is 100nm .
[0102] The preparation method of the homojunction perovskite photodetector described in this embodiment comprises the following steps:
[0103] (1) Spin-coat a 1-butanol solution of bis(acetylacetonato)diisop...
Embodiment 3
[0109] The difference between this embodiment and Example 1 is that the thickness of the N-type perovskite film is 480nm, the thickness of the P-type perovskite film is 80nm, and the thickness of the N-type perovskite film and the P-type perovskite film The ratio is 6, and other conditions are identical with embodiment 1.
[0110] The difference between the preparation method of the homojunction perovskite photodetector in this example and that in Example 1 is that the amount of raw materials used in the preparation process of the N-type perovskite film and the P-type perovskite film is adjusted so that the structure meets the above-mentioned Requirement, other conditions are compared with embodiment 1 and are exactly the same.
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| electrical resistance | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More - R&D
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com

