High-flux low-temperature plasma discharge device and method for decomposing hydrogen sulfide

A low-temperature plasma and discharge device technology, applied in the field of plasma chemistry, can solve the problems of low hydrogen sulfide conversion rate, high energy consumption, and inability to achieve large flow rates

Active Publication Date: 2022-07-29
CHINA PETROLEUM & CHEM CORP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The purpose of the present invention is to provide a new high-pass Measuring low-temperature plasma discharge device and method for decomposing hydrogen sulfide using the device

Method used

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  • High-flux low-temperature plasma discharge device and method for decomposing hydrogen sulfide
  • High-flux low-temperature plasma discharge device and method for decomposing hydrogen sulfide
  • High-flux low-temperature plasma discharge device and method for decomposing hydrogen sulfide

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0119] use figure 1 The shown device performs hydrogen sulfide decomposition reaction, and the specific structure and structural parameters of the low-temperature plasma discharge device are as follows:

[0120] The device includes:

[0121] a first cavity, the first cavity is respectively provided with a first inlet and a first outlet;

[0122] High-voltage electrodes, the high-voltage electrodes are arranged in the first cavity, and the high-voltage electrodes are arranged in the first cavity with 5 layers; in each layer structure containing the high-voltage electrodes, the high-voltage electrodes are The number is 7, each of the high-voltage electrodes is parallel to each other, and there is a gap between two adjacent high-voltage electrodes. The material for forming the high-voltage electrodes is a hollow stainless steel metal tube, and the dimensions of each of the high-voltage electrodes are the same. ;

[0123] A ground electrode, the ground electrode is arranged in ...

Embodiment 2

[0136] This embodiment adopts figure 2 The shown device performs hydrogen sulfide decomposition reaction, and the specific structure and structural parameters of the discharge device are as follows:

[0137] The device includes:

[0138] a first cavity, the first cavity is respectively provided with a first inlet and a first outlet;

[0139] High-voltage electrodes, the high-voltage electrodes are arranged in the first cavity, and the high-voltage electrodes are arranged in the first cavity with 5 layers; in each layer structure containing the high-voltage electrodes, the high-voltage electrodes are The number is 7, each of the high-voltage electrodes is parallel to each other, and there is a gap between two adjacent high-voltage electrodes, the material for forming the high-voltage electrodes is a hollow graphite tube, and the dimensions of each of the high-voltage electrodes are the same;

[0140] A ground electrode, the ground electrode is arranged in the first cavity, a...

Embodiment 3

[0153] This embodiment uses a discharge device similar to that of Embodiment 1, the difference is that the barrier medium in the discharge device of this embodiment is arranged on the outer surfaces of the high voltage electrode and the ground electrode, that is, a double dielectric barrier discharge.

[0154] And the gaps between two adjacent high-voltage electrodes and two adjacent ground electrodes are equal, and the gap between two adjacent layer structures is 1.2 times the gap between two adjacent high-voltage electrodes, L 2 The ratio to the thickness D1 of the blocking medium is 15:1;

[0155] The size of each of the high-voltage electrodes is the same as that of each of the ground electrodes, and the ratio of diameter to length is 1:130;

[0156] L 2 with the length L of the discharge tube 3 The ratio between them is 1:300;

[0157] The volume of the first cavity of the low temperature plasma discharge device of this embodiment is 3.2L.

[0158] H is introduced in...

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Abstract

The invention relates to the field of plasma chemistry, and discloses a high-flux low-temperature plasma discharge device and a method for decomposing hydrogen sulfide, comprising: a first cavity (1); The second cavity (2); the high-voltage electrode (3) and the ground electrode (4) arranged in the first cavity (1), a blocking medium, and the blocking medium is arranged on the high-voltage electrode (3) and / or the The outer surface of the ground electrode (4). The low-temperature plasma discharge device provided by the present invention has the advantages of high hydrogen sulfide conversion rate, low energy consumption and capable of realizing large-flow hydrogen sulfide treatment.

Description

technical field [0001] The invention relates to the field of plasma chemistry, in particular to a high-flux low-temperature plasma discharge device and a method for decomposing hydrogen sulfide. Background technique [0002] hydrogen sulfide (H 2 S) is a highly toxic and foul-smelling acid gas, which not only causes corrosion of metals and other materials, but also harms human health and pollutes the environment. At present, my country's large and medium-sized oil refineries use the traditional Claus method to treat H-containing 2 S tail gas, and recover sulfur. The method recovers only the sulfur in the hydrogen sulfide, but converts the precious hydrogen into water. From the perspective of comprehensive utilization of resources, in the traditional hydrogen sulfide recovery process, hydrogen resources have not been effectively utilized. [0003] Therefore, the decomposition of hydrogen sulfide into sulfur and hydrogen has gradually become a technical field that domestic...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B17/04C01B3/04H05H1/24
CPCC01B17/0495C01B3/04H05H1/2406Y02E60/36
Inventor 张婧徐伟张铁任君朋王世强张树才王林关银霞孙峰刘全桢石宁周明川李亚辉唐诗雅
Owner CHINA PETROLEUM & CHEM CORP
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