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Silicon dioxide-diamond composite material and preparation method thereof

A composite material and silicon dioxide technology, applied in metal material coating process, gaseous chemical plating, coating, etc., can solve the problems of insufficient bonding force of film-forming base, inability to fully utilize diamond and excellent performance, etc., to avoid Insufficient bonding between layers, continuous adjustment of oxidation resistance, and cost-saving effects

Active Publication Date: 2020-08-28
TAIYUAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, if it is compounded in the form of a thin film or a coating, the performance difference between the two will cause the problem of insufficient bonding force of the film base, and the excellent performance of diamond and diamond cannot be fully utilized.

Method used

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  • Silicon dioxide-diamond composite material and preparation method thereof
  • Silicon dioxide-diamond composite material and preparation method thereof
  • Silicon dioxide-diamond composite material and preparation method thereof

Examples

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Effect test

Embodiment 1

[0035] A silicon dioxide-diamond composite material, the composite material is a bulk material formed by a multilayer film, and each layer of film is made of SiO 2 The mixed phase structure composed of diamond and diamond, the thickness of each film is 20μm, SiO 2 And the grain size of diamond is 13 μm.

[0036] The preparation method of above-mentioned silicon dioxide-diamond composite material, comprises the steps:

[0037] 1) Using the microwave plasma chemical vapor deposition method, introducing silicon-carbon-containing gas as the precursor and hydrogen as the reaction gas, co-depositing diamond 2-1 and SiC 2-2 on the surface of the substrate 1 to prepare a SiC-diamond hybrid Phase film 2, such as figure 1 As shown, the SiC-diamond mixed phase film 2 includes a mixed phase of diamond 2-1 and SiC 2-2; the specific preparation method of the SiC-diamond mixed phase film 2 is: use graphite as the substrate 1, and use the substrate 1 Deionized water and absolute ethanol we...

Embodiment 2

[0041] A silicon dioxide-diamond composite material, the composite material is a bulk material formed by a multilayer film, and each layer of film is made of SiO 2 The mixed phase structure composed of diamond and diamond, the thickness of each film is 10μm, SiO 2 And the diamond grain size is 5 μm.

[0042] The preparation method of above-mentioned silicon dioxide-diamond composite material, comprises the steps:

[0043] 1) Using the microwave plasma chemical vapor deposition method, introducing silicon-containing gas and carbon-containing gas as the precursor, hydrogen as the reaction gas, and co-depositing diamond 2-1 and SiC 2-2 on the surface of the substrate 1 to prepare SiC - Diamond mixed phase film 2, such as figure 1 As shown, the SiC-diamond mixed phase film 2 includes a mixed phase of diamond 2-1 and SiC 2-2; the specific preparation method of the SiC-diamond mixed phase film 2 is: use single crystal silicon as the substrate 1, and the substrate 1 Ultrasonic cle...

Embodiment 3

[0047] A silicon dioxide-diamond composite material, the composite material is a bulk material formed by a multilayer film, and each layer of film is made of SiO 2 The mixed phase structure composed of diamond and diamond, the thickness of each film is 1μm, SiO 2 And the grain size of diamond is 0.1 μm.

[0048] The preparation method of above-mentioned silicon dioxide-diamond composite material, comprises the steps:

[0049] 1) Using the microwave plasma chemical vapor deposition method, introducing silicon-carbon-containing gas as the precursor and hydrogen as the reaction gas, co-depositing diamond 2-1 and SiC 2-2 on the surface of the substrate 1 to prepare a SiC-diamond hybrid Phase film 2, such as figure 1 As shown, the SiC-diamond mixed phase film 2 includes a mixed phase of diamond 2-1 and SiC 2-2; the specific preparation method of the SiC-diamond mixed phase film 2 is: use single crystal silicon as the substrate 1, and the substrate 1 Ultrasonic cleaning was perfo...

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Abstract

Disclosed in the present invention are a silicon dioxide-diamond composite material and a preparation method thereof. The composite material is a body material formed by multiple layers of films; eachlayer of films is of a mixed phase structure consisting of SiO2 and diamond; during preparation, a microwave plasma chemical vapor deposition method is firstly used for co-deposition of diamond and SiC on the surface of a matrix to form an SiC-diamond mixed phase film; and then, the SiC-diamond mixed phase film is oxidized to convert SiC into SiO2 so as to prepare an SiO2-diamond mixed phase film. The preparation of the SiC-diamond mixed phase film and the process of converting SiC into SiO2 are repeated, so that the SiO2-diamond mixed phase film is continuously thickened; and after the needed thickness is reached, the matrix is removed to obtain the SiO2-diamond composite material. The SiO2-diamond composite material in the present invention has the permeability of silicon oxide and excellent heat dispersivity of diamond, and can be used for places needing excellent permeability and heat dispersivity.

Description

technical field [0001] The invention belongs to the technical field of chemical vapor deposition, in particular to a silicon dioxide-diamond composite material and a preparation method thereof. Background technique [0002] Diamond has good light transmission performance, strong resistance to radiation damage, strong corrosion resistance and wear resistance, and excellent heat dissipation performance, and can be used as X for armored vehicles serving in harsh environments Ray window materials and infrared window materials, etc. At the same time, diamond is also the best choice for high-speed intercepting missile hoods, aviation aircraft window materials, fighter jet nose detection window materials and infrared array thermal imaging guide windows. However, the thermal stability of diamond is poor. When working in a high-temperature oxygen-containing environment or a high-speed environment, air friction will heat the window or hood made of it, causing the surface temperature ...

Claims

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Application Information

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IPC IPC(8): C23C16/27C23C16/32C23C16/517C23C16/56
CPCC23C16/274C23C16/276C23C16/325C23C16/56C23C16/517
Inventor 马永郑可吴玉程黑鸿君高洁周兵
Owner TAIYUAN UNIV OF TECH
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