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Silicon dioxide-diamond composite material coated with silicon dioxide film and preparation method thereof

A silicon dioxide film, silicon dioxide technology, applied in metal material coating process, gaseous chemical plating, coating and other directions, can solve problems such as inferior to diamond, poor heat dissipation, oxidation, etc., to avoid layer The effect of insufficient bonding force and wide application range

Active Publication Date: 2020-10-09
TAIYUAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But in terms of corrosion resistance, any coating is inferior to diamond. Once the outer oxide protective film is corroded, diamond will face the problem of being oxidized again due to exposure to the atmosphere.
[0003] Silicon dioxide is an oxide of silicon, which is transparent in the visible and near-infrared regions. It is an ideal optical film. At the same time, silicon dioxide has excellent oxidation resistance and good corrosion resistance, but its heat dissipation performance is poor. making it unsuitable for environments requiring good heat dissipation
However, there is no report on the preparation of diamond and silicon dioxide into mixed phase composite materials.

Method used

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  • Silicon dioxide-diamond composite material coated with silicon dioxide film and preparation method thereof
  • Silicon dioxide-diamond composite material coated with silicon dioxide film and preparation method thereof

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Effect test

Embodiment 1

[0046] A silicon dioxide-diamond composite material covered by a silicon dioxide film used as a coating material, consisting of a core and a surface layer; wherein, the core is a multilayer film structure, and each layer of film is composed of silicon dioxide and diamond The mixed phase is composed of a thickness of 5 μm; the surface layer is a silicon dioxide film with a thickness of 10 μm; the surface layer of silicon dioxide film covers the upper surface and side surface of the core.

[0047] The preparation method of the above-mentioned composite material as coating material, comprises the steps:

[0048] 1) Using the microwave plasma chemical vapor deposition method, introducing tetramethylsilane as the precursor and hydrogen as the reaction gas, silicon carbide and diamond are co-deposited on the surface of the base material 1 to form a layer of silicon carbide-diamond mixed phase film 2, such as figure 1 Shown in a.

[0049] The specific process parameters for the pre...

Embodiment 2

[0056] A silicon dioxide-diamond composite material covered by a silicon dioxide film used as a coating material, consisting of a core and a surface layer; wherein, the core is a multilayer film structure, and each layer of film is composed of silicon dioxide and diamond The mixed phase is composed of a thickness of 20 μm; the surface layer is a silicon dioxide film with a thickness of 1 μm; the surface layer of silicon dioxide film covers the upper surface and the side surface of the core.

[0057] The preparation method of the above-mentioned composite material as coating material, comprises the steps:

[0058] 1) Using the microwave plasma chemical vapor deposition method, silane and methane are introduced as precursors, and hydrogen is used as the reaction gas, and silicon carbide and diamond are co-deposited on the surface of the base material 1 to form a layer of silicon carbide-diamond mixed phase film 2 ,Such as figure 1 Shown in a.

[0059] The specific process para...

Embodiment 3

[0066] A silicon dioxide-diamond composite material covered by a silicon dioxide film used as a coating material, consisting of a core and a surface layer; wherein, the core is a multilayer film structure, and each layer of film is composed of silicon dioxide and diamond The mixed phase is composed of a thickness of 1 μm; the surface layer is a silicon dioxide film with a thickness of 35 μm; the surface layer of silicon dioxide film covers the upper surface and side surface of the core.

[0067] The preparation method of the above-mentioned composite material as coating material, comprises the steps:

[0068] 1) Using the microwave plasma chemical vapor deposition method, silicon tetrachloride and methane are introduced as precursors, hydrogen is used as the reaction gas, and silicon carbide and diamond are co-deposited on the surface of the base material 1 to form a layer of silicon carbide-diamond hybrid Phase film 2, such as figure 1 Shown in a.

[0069] The specific proc...

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Abstract

The invention provides a silicon dioxide-diamond composite material coated with silicon dioxide film and a preparation method thereof, and solves the problem of the application limitation of diamond and silicon dioxide. The composite material is composed of a core part and a surface layer, the core part is a multilayer film structure, each layer of film is a mixed phase composed of the silicon dioxide and the diamond, and the surface layer is the silicon dioxide film. When the composite material is prepared, the microwave plasma chemical vapor deposition technology is firstly used to carry outco-deposition of the diamond and the silicon carbide on the surface of a graphite substrate, and then the silicon carbide- diamond composite film is etched by microwave oxygen plasma to form a silicon dioxide- diamond mixed phase film, and a multilayer silicon dioxide- diamond mixed phase film is continuously prepared to form the silicon dioxide- diamond multilayer film structure, and finally thesilicon dioxide film is prepared on the surface of the silicon dioxide-diamond multilayer film structure. The preparation of the composite material of the invention does not adopt a traditional coating process, and the prepared composite material has good permeability, heat dissipation and oxidation resistance, and is suitable for being used as a window material.

Description

technical field [0001] The invention belongs to the technical field of chemical vapor deposition, in particular to a silicon dioxide-diamond composite material coated with a silicon dioxide film and a preparation method thereof. Background technique [0002] Diamond has good light transmission performance, strong resistance to radiation damage, strong corrosion resistance and wear resistance, and excellent heat dissipation performance, making it suitable for armored vehicles serving in harsh environments At the same time, diamond is also the best choice for high-speed interception missile hoods, aviation aircraft window materials, fighter jet head detection window materials and infrared array thermal imaging guide windows. However, the thermal stability of diamond is poor. When working in a high-temperature oxygen-containing environment or in a high-speed environment, the aerodynamic force will heat the window or hood made of it, causing the surface temperature to rise sharp...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/30C23C16/40C23C16/511C23C16/56C23C16/01
CPCC23C16/30C23C16/402C23C16/511C23C16/56C23C16/01
Inventor 高洁周兵于盛旺郑可王永胜黑鸿君吴艳霞
Owner TAIYUAN UNIV OF TECH
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