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Silica-diamond composite material coated with silica film and preparation method thereof

A technology of silicon dioxide film and silicon dioxide, applied in metal material coating process, gaseous chemical plating, coating, etc. No problems such as diamonds, to achieve the effect of optical transparency, avoiding insufficient interlayer bonding, and continuous adjustment of oxidation resistance

Active Publication Date: 2022-03-08
TAIYUAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But in terms of corrosion resistance, any coating is inferior to diamond. Once the outer oxide protective film is corroded, diamond will face the problem of being oxidized again due to exposure to the atmosphere.
[0003] Silicon dioxide is an oxide of silicon, which is transparent in the visible and near-infrared regions. It is an ideal optical film. At the same time, silicon dioxide has excellent oxidation resistance and good corrosion resistance, but its heat dissipation performance is poor. making it unsuitable for environments requiring good heat dissipation
However, there is no report on the preparation of diamond and silicon dioxide into mixed phase composite materials.

Method used

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  • Silica-diamond composite material coated with silica film and preparation method thereof
  • Silica-diamond composite material coated with silica film and preparation method thereof

Examples

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Effect test

Embodiment 1

[0046] A silicon dioxide-diamond composite material covered by a silicon dioxide film used as a coating material, consisting of a core and a surface layer; wherein, the core is a multilayer film structure, and each layer of film is composed of silicon dioxide and diamond The mixed phase is composed of a thickness of 5 μm; the surface layer is a silicon dioxide film with a thickness of 10 μm; the surface layer of silicon dioxide film covers the upper surface and side surface of the core.

[0047] The preparation method of the above-mentioned composite material as coating material, comprises the steps:

[0048] 1) Using the microwave plasma chemical vapor deposition method, introducing tetramethylsilane as the precursor and hydrogen as the reaction gas, silicon carbide and diamond are co-deposited on the surface of the base material 1 to form a layer of silicon carbide-diamond mixed phase film 2, such as figure 1 Shown in a.

[0049] The specific process parameters for the pre...

Embodiment 2

[0056] A silicon dioxide-diamond composite material covered by a silicon dioxide film used as a coating material, consisting of a core and a surface layer; wherein, the core is a multilayer film structure, and each layer of film is composed of silicon dioxide and diamond The mixed phase is composed of a thickness of 20 μm; the surface layer is a silicon dioxide film with a thickness of 1 μm; the surface layer of silicon dioxide film covers the upper surface and side surface of the core.

[0057] The preparation method of the above-mentioned composite material as coating material, comprises the steps:

[0058] 1) Using the microwave plasma chemical vapor deposition method, silane and methane are introduced as precursors, and hydrogen is used as the reaction gas, and silicon carbide and diamond are co-deposited on the surface of the base material 1 to form a layer of silicon carbide-diamond mixed phase film 2 ,Such as figure 1 Shown in a.

[0059] The specific process paramete...

Embodiment 3

[0066] A silicon dioxide-diamond composite material covered by a silicon dioxide film used as a coating material, consisting of a core and a surface layer; wherein, the core is a multilayer film structure, and each layer of film is composed of silicon dioxide and diamond The mixed phase is composed of a thickness of 1 μm; the surface layer is a silicon dioxide film with a thickness of 35 μm; the surface layer of silicon dioxide film covers the upper surface and side surface of the core.

[0067] The preparation method of the above-mentioned composite material as coating material, comprises the steps:

[0068] 1) Using the microwave plasma chemical vapor deposition method, silicon tetrachloride and methane are introduced as precursors, hydrogen is used as the reaction gas, and silicon carbide and diamond are co-deposited on the surface of the base material 1 to form a layer of silicon carbide-diamond hybrid Phase film 2, such as figure 1 Shown in a.

[0069] The specific proc...

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Abstract

The invention is a silicon dioxide-diamond composite material coated with a silicon dioxide film and a preparation method thereof, which solves the problem of application limitation of diamond and silicon dioxide. The composite material is composed of a core and a surface layer, the core is a multi-layer film structure, each layer of film is a mixed phase composed of silicon dioxide and diamond, and the surface layer is a silicon dioxide film. When preparing the composite material, the co-deposition of diamond and silicon carbide is first carried out on the surface of the graphite substrate by microwave plasma chemical vapor deposition technology, and then the silicon carbide-diamond composite film is etched by microwave oxygen plasma to form silicon dioxide-diamond Mixed phase film, continue to prepare a multilayer silica-diamond mixed phase film to form a silica-diamond multilayer film structure, and finally prepare a silicon dioxide film on the surface of the silica-diamond multilayer film structure. The preparation of the composite material of the invention does not adopt the traditional coating process, and the prepared composite material has good permeability, heat dissipation and oxidation resistance, and is suitable for use as a window material.

Description

technical field [0001] The invention belongs to the technical field of chemical vapor deposition, in particular to a silicon dioxide-diamond composite material coated with a silicon dioxide film and a preparation method thereof. Background technique [0002] Diamond has good light transmission performance, strong resistance to radiation damage, strong corrosion resistance and wear resistance, and excellent heat dissipation performance, making it suitable for armored vehicles serving in harsh environments At the same time, diamond is also the best choice for high-speed interception missile hoods, aviation aircraft window materials, fighter jet head detection window materials and infrared array thermal imaging guide windows. However, the thermal stability of diamond is poor. When working in a high-temperature oxygen-containing environment or in a high-speed environment, the aerodynamic force will heat the window or hood made of it, causing the surface temperature to rise sharp...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/30C23C16/40C23C16/511C23C16/56C23C16/01
CPCC23C16/30C23C16/402C23C16/511C23C16/56C23C16/01
Inventor 高洁周兵于盛旺郑可王永胜黑鸿君吴艳霞
Owner TAIYUAN UNIV OF TECH
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