Cross-scale micro-nano structure three-dimensional measurement device and measurement method

Abstract

The invention discloses a cross-scale micro-nano structure three-dimensional measurement device and a measurement method. The device is characterized by comprising an atomic force probe scanning microscope assembly, an objective lens turntable, a white light interference system, a nanoscale vertical micro-displacement platform, a laser interference displacement metering system I, a measurement andcontrol system, a laser interference displacement metering system II, a sample piece, a two-dimensional piezoelectric ceramic scanning platform, a two-dimensional electric scanning platform and a laser interference displacement metering system III. According to the invention, by rotating the objective lens turntable, the measuring device is switched between a white light interference measuring mode and an atomic force probe scanning measuring mode, wherein the white light interference measuring mode is mainly used for large-scale measurement of a micron-scale structure, and the atomic force probe scanning measuring mode is used for carrying out horizontal high-resolution measurement on the nanoscale feature region, so that large-range and high-resolution measurement on the surface of thecross-scale micro-nano structure is achieved, and measurement of the cross-scale (micron scale, submicron scale and below scale) structure can be achieved in one set of system.

Description

technical field [0001] The invention belongs to the field of ultra-precise surface topography measurement, and in particular relates to a three-dimensional measurement device and method for cross-scale micro-nano structures. Background technique [0002] With the development of advanced manufacturing technologies such as lithography, ultra-precision processing, and optical processing, the surface of cross-scale micro-nano structures has become an important surface feature of key components in the fields of solar cells, laser holographic anti-counterfeiting, and flat-panel displays. The overall macroscopic size of these features is gradually increasing, while the local microscopic features are more refined, resulting in the measurement requirements of both large-scale and high-resolution. Traditional surface topography measurement instruments, such as stylus profilers, optical profilers, atomic force microscopes, etc., have been widely used in ultra-precision surface measurem...

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Problems solved by technology

[0004] Aiming at at least one of the above defects or improvement needs in the prior art, the present invention provides a three-dimensional measurement device for cross-scale micro-nano structures, which can realize large-scale and high-resolution measurement of the surface of cross-scale micro-nano structures, and can The measurement of cross-scale (micron-scale, sub-micron and below-scale) structures can be realized in this set of systems, which avoids the problem of positioning reference errors caused by the need for different measuring instruments to measure micron-scale structures and sub-micron and below-scale structures, and high-resolution It is difficult to find the measured area when force instruments measure submicron and below-scale structures, and the data fusion and time-consuming problems brought about by the collaborative measurement of multiple instruments

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