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Inspection system, lithographic apparatus, and inspection method

A technology of inspection system and inspection method, applied in the field of inspection system

Pending Publication Date: 2020-10-30
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Given this, aligning the two layers at the bottom of the IC will be the most challenging

Method used

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  • Inspection system, lithographic apparatus, and inspection method
  • Inspection system, lithographic apparatus, and inspection method
  • Inspection system, lithographic apparatus, and inspection method

Examples

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Embodiment Construction

[0030] figure 1 A lithographic apparatus according to an embodiment of the invention is schematically depicted. The apparatus comprises: an illumination system (illuminator) IL configured to condition a radiation beam B (e.g. UV radiation or any other suitable radiation); a mask support structure (e.g. a mask table) MT which The mold support structure is configured to support a patterning device (eg mask) MA and is connected to a first positioning device PM configured to precisely position the patterning device according to certain parameters. The apparatus also includes a substrate table (e.g. wafer table) WT or "substrate support" configured to hold a substrate (e.g. a resist-coated wafer) W and connected to a second positioner PW, The second positioner PW is configured to precisely position the substrate according to certain parameters. The apparatus also includes a projection system (e.g. a refractive projection lens system) PS configured to project the pattern imparted ...

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Abstract

An inspection system is described, the system comprising: a selective deposition tool configured to: receive a sample; selectively deposit a material onto the sample; an inspection tool configured to:- perform an inspection process on the sample provided with the deposited material, an enclosure configured to enclose the selective deposition tool and the inspection tool.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from European Patent Application 18162351.3 filed on March 16, 2018, the entire content of which is hereby incorporated by reference. technical field [0003] The invention relates to an inspection system, an inspection method and photolithography equipment. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In this case, a patterning device (a patterning device may alternatively be referred to as a mask or reticle) may be used to create the circuit pattern to be formed on the individual layers of the IC. Such a pattern may be transferred to a target portion (eg comprising part of a die or several dies) on a substrate (eg a silicon wafer). Transfer of the pattern is typical...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67G03F7/20
CPCG03F7/7065G03F7/70808H01L21/67173H01L21/67207H01L21/67213G01N23/2251G03F7/7085H01L21/67288
Inventor A·O·波利亚科夫E·P·斯马克曼A·尼基帕罗夫阿尔伯特斯·维克特·盖拉达斯·曼格纳斯
Owner ASML NETHERLANDS BV
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