Workbench of photoetching machine
A workbench and lithography machine technology, applied in opto-mechanical equipment, micro-lithography exposure equipment, optics, etc., can solve problems such as instability, slow transmission speed, and silicon wafer accuracy errors, so as to reduce the impact and improve the exposure accuracy. Effect
Inactive Publication Date: 2020-11-06
叶建蓉
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Problems solved by technology
Common workpiece table cable facilities passively follow the workpiece table to move in the XY plane. When the workpiece table performs high-speed movement and nano-level precise positioning, the dragging pipeline facilities will cause disturbance to the workpiece table, thereby affecting the accuracy of the equipment.
[0003] The Chinese invention patent application with the authorized announcement number CN103576463B discloses the lithography machine workbench and its working method. Specifically, the workbench and the control system are connected through wireless signals. However, the current disadvantage of wireless signal connection is that the wireless signal is affected by the surrounding environment. , will lead to instability and slow transmission speed, which will easily lead to large errors in the accuracy of each batch of silicon wafers
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[0025] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content described in this specification. The present invention can also be implemented or applied through other different specific implementation modes, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention. It should be noted that the diagrams provided in the following embodiments are only schematically illustrating the basic concept of the present invention, and the following embodiments and the features in the embodiments can be combined with each other in the case of no conflict.
[0026] Wherein, the accompanying drawings are for illustrative purposes only, and represent only schematic diagrams, rather than physical drawings, and should...
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The invention discloses a workbench of a photoetching machine, and belongs to the technical field of lithographic equipment. The workbench comprises a first planar motor, a second planar motor, and anauxiliary workbench and a silicon wafer workbench which are in transmission connection with the first planar motor and the second planar motor respectively, the auxiliary workbench is connected witha first cable, the silicon wafer workbench is connected with a second cable, a channel for the second cable to pass through is formed in the middle of the auxiliary workbench, and a fixing assembly used for fixing the second cable and the auxiliary workbench is arranged in the channel. The first planar motor and the second planar motor are respectively controlled to operate through two groups of servo controllers, the two groups of servo controllers receive the same pulse of the control system, and the first planar motor and the second planar motor realize synchronous operation. According to the workbench, the influence of cable disturbance on the workbench can be reduced, so that the exposure precision of the wafer is improved.
Description
technical field [0001] The invention belongs to the technical field of photolithography equipment, and in particular relates to a workbench of a photolithography machine. Background technique [0002] The typical structural form of the lithography machine table system is a combination of coarse and fine movements. Because the planar motor has the characteristics of high output density, high speed, high reliability, etc., and it is easy to integrate it into the controlled object, it has a responsive The advantages of fast speed, high control sensitivity, and simple mechanical structure have been applied to semiconductor lithography equipment to realize long-stroke coarse motion of the workpiece table. However, due to the use of planar motors to achieve long-stroke coarse movement, the workpiece table has no X and Y guide rails, and various communication cables, power cables, air pipes, water pipes and other pipeline facilities used to support the workpiece table need to follo...
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IPC IPC(8): G03F7/20
CPCG03F7/70725
Inventor 叶建蓉
Owner 叶建蓉