Laser emitting device

Abstract

The invention discloses a laser emitting device, which is used for generating 780nm laser in a direct frequency doubling mode. The device comprises a semiconductor laser, the wavelength of output laser being 1560 nm, and line width of output laser being smaller than 10 kHz; a double-concave-surface lens frequency doubling resonant cavity, comprising a first concave surface lens and a second concave surface lens which are oppositely arranged based on concave surfaces, a high-reflection film with the wavelength of 780 nm and an antireflection film with the wavelength of 1560 nm being evaporatedon the surface of the first concave surface lens, and a high-reflection film with the wavelength of 1560 nm and an antireflection film with the wavelength of 780 nm being evaporated on the surface ofthe second concave surface lens; and a frequency doubling crystal, the surface of the frequency doubling crystal being evaporated with antireflection films with wavelengths of 1560nm and 780nm, and the frequency doubling crystal being arranged between the first concave lens and the second concave lens and being used for carrying out frequency doubling treatment on the laser from the semiconductorlaser. According to the laser emitting device provided by the invention, emission of 780nm narrow-linewidth laser obtained by direct frequency multiplication of 1560nm is realized, and the frequency multiplication light width is further narrowed along with the narrowing of the signal light width.

Description

technical field [0001] The invention relates to the field of nonlinear optical frequency conversion and laser technology, in particular to a laser emitting device for direct frequency doubling of 780nm narrow-linewidth high-performance laser. Background technique [0002] 780nm laser is widely used in the fields of atomic physics and spectroscopy, atmospheric sensing and optical communication, especially because 780nm corresponds to the absorption line of the alkali metal element rubidium, so the research of 780nm laser light source is very important for quantum information storage, laser cooling and atomic capture , Quantum frequency calibration and other cutting-edge science have very important value. [0003] In the process of realizing the concept of the present invention, the inventors have found that there are at least the following problems in the related art. The traditional method to generate 780nm laser is to use III-V group material semiconductor lasers. The 780nm...

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Problems solved by technology

[0003] In the process of realizing the concept of the present invention, the inventors have found that there are at least the following problems in the related art. The traditional method to generate 780nm laser is to use III-V group material semiconductor lasers. The 780nm laser produced has poor monochromaticity and coherence and needs to be integrated Tapered amplifier structure to increase output power

Moreover, the signal light width in the traditional method is very high, which is not conducive to the subsequent frequency multiplication

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