Detection device and detection method for deep ultraviolet depolarizer

Abstract

The invention discloses a detection device and a detection method for a deep ultraviolet depolarizer. In the prior art, the working wavelength of a high-end photoetching machine is located in a deep ultraviolet band, the selectable optical materials are very rare, and a plurality of polarization devices commonly used in other bands are difficult to process, so that the performance detection of thedepolarizer is difficult. In the device, light emitted by a monochromatic light source sequentially passes through a Brewster polarizer, a depolarizer to be detected and a Brewster polarization analysis system, wherein the Brewster polarization analysis system comprises a Brewster polarization analyzer and a detector, and the detector records the emergent intensity. The surface of the polarizer and the surface of the analyzer are planes, light is incident at a Brewster angle, and linearly polarized light is obtained. The polarization degree of the depolarized light can be obtained according to the recorded maximum value and minimum value of the intensity of the emergent light, so that the depolarization performance of the depolarizer is reflected. The deep ultraviolet depolarizer detection device and the detection method provided by the invention have the characteristics of stable structure, concise optical path, easy production and manufacturing of components and the like, and satisfy the detection requirements of the deep ultraviolet depolarizer.

Description

technical field [0001] The invention relates to performance detection of a depolarizer, and in particular provides a deep ultraviolet depolarizer detection device and detection method, which have the characteristics of being suitable for deep ultraviolet depolarizer detection, stable structure, simple optical path, and easy production and manufacture of components. Background technique [0002] With the development of large-scale integrated circuits, the resolution requirements for photolithography systems are getting higher and higher. Depolarizers can eliminate the response to the polarization state of light beams in precision optical systems, and play an important role in high-end lithography machines. Since strict analysis requires the use of Stokes vector and Muller matrix algorithms, the impact of various errors in actual processing is difficult to calculate, so it is necessary to directly perform polarization detection on the finished product. However, the operating ...

AI Technical Summary

Problems solved by technology

In particular, the depolarizers used in high-end lithography machines have working wavelengths in the deep ultraviolet range, and the quality of polarizers is difficult to guarantee, which puts higher requirements on the simplicity of components

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