Photoelectric detector based on quantum dot grating enhancement, preparation method of photoelectric detector and detection light adjusting method
A photodetector and quantum dot technology, applied in the field of photoelectric detection, can solve the problems of not realizing the regulation of the wavelength of the absorbed light in the differential detection of different polarized light, not realizing the different detection of different polarized light, not realizing the light absorption efficiency, etc. Application prospects and performance advantages, improved detection responsivity, and polarization-sensitive effects
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Embodiment 1
[0094] In the photodetector based on quantum dot grating enhancement described in this embodiment, the quantum dot material in the quantum dot layer and the quantum dot high refractive index grating structure layer is PbS quantum dots;
[0095] The thickness of the quantum dot layer is 200nm;
[0096] The depth of the quantum dot high refractive index grating structure layer is 0.1818 μm, the period is 0.7422 μm, and the duty factor is 0.2968;
[0097] The substrate is SiO 2 .
[0098] In this embodiment, the photodetector based on quantum dot grating enhancement adopts such as image 3 Prepared by the method;
[0099] Wherein, in the preparation process of the quantum dot high refractive index grating structure layer and the quantum dot layer, the solution composition of the spin coating solution is a n-octane solution of PbS quantum dot material with a concentration of 50mg / mL, the spin coating speed is 2500rpm, and the acceleration is 1250acc Spin-coat for 25s, and then...
Embodiment 2
[0101] The difference between this embodiment and Embodiment 1 is that the depth of the quantum dot high refractive index grating structure layer is 0.2625 μm, the period is 1.1142 μm, and the duty factor is 0.3764; other parameters and conditions are exactly the same as those in Embodiment 1.
Embodiment 3
[0103] The difference between this embodiment and Embodiment 1 is that the depth of the quantum dot high-refractive index grating structure layer is 0.3 μm, the period is 1.3236 μm, and the duty factor is 0.41; other parameters and conditions are exactly the same as those in Embodiment 1.
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