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A high-purity gas storage, adjustment and delivery cabinet

A high-purity gas and buffer tank technology, applied in the field of chemical gas storage and control, can solve problems such as hidden safety hazards, strong corrosiveness, inconvenience in maintenance, repair, and replacement, and achieve the effect of ensuring cleanliness and reducing environmental pollution.

Active Publication Date: 2022-05-03
黄宏琪
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since each compartment is fixed, it is extremely inconvenient to maintain, repair, and replace various pressure regulating valves, filters, hand valves, pneumatic valves, mass flow meters, and buffer tanks after the first installation; moreover The above-mentioned gas components and high-purity gases used need a high-clean and low-humidity environment; in addition, if silicon tetrachloride, germanium tetrachloride, phosphorus oxychloride, etc. leak, they will be extremely corrosive or extremely Strong toxicity, there is a great safety hazard

Method used

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  • A high-purity gas storage, adjustment and delivery cabinet
  • A high-purity gas storage, adjustment and delivery cabinet

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Embodiment Construction

[0025] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not constitute a conflict with each other.

[0026] Taking the process gas buffer cabinet for preparing optical fiber preform as an example, the structure and functions of the cabinet body of the present invention are illustrated.

[0027] Such as figure 1 As shown, the size of the outer cabinet body 1 is selected as 1000mm*700mm*1500mm, and the material is coated high-strength steel, which is divided into inside the cabinet body: air int...

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Abstract

The invention belongs to the technical field of chemical gas storage and control, and more specifically relates to a high-purity gas storage, adjustment and delivery cabinet. The use of detachable partition boards and pipe installation boards can make the gas cabinet very small, and it is very convenient to install, overhaul and replace gas components in different functional areas; the combination of heat preservation unit and sealing strip can ensure The gas and temperature environment of different unit areas are kept independent to ensure the fine control of the temperature of each functional area. In addition, the materials used will not produce particles, which ensures the cleanliness; high-purity nitrogen is used to maintain a slight positive pressure in each functional area , can prevent dust and water vapor in the air from entering the cabinet, and create a high-cleanliness, low-humidity environment for the gas components; using the exhaust port, the exhaust can be opened in time when a leak is detected without opening the cabinet door , Reduce environmental pollution and harm to operators as much as possible.

Description

technical field [0001] The invention belongs to the technical field of chemical gas storage and control, and more specifically relates to a high-purity gas storage, adjustment and delivery cabinet. Background technique [0002] In the field of optical fiber preform preparation or pan-semiconductor preparation, silicon tetrachloride, germanium tetrachloride, phosphorus oxychloride, oxygen, helium, Freon, chlorine and other high-purity gas raw materials are often used. In order to carry out the process accurately, these gases need to be filtered, pressure adjusted, flow controlled, valve controlled, etc., and flow control requires the gas to be within a constant temperature range. In addition, silicon tetrachloride, germanium tetrachloride, phosphorus oxychloride, etc. are in a liquid state at room temperature. Whether it is through carrier gas or direct evaporation, the buffer tank needs to be heated and kept warm. [0003] The existing high-purity gas storage, adjustment, a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F17D3/01C03B37/014
CPCF17D3/01C03B37/014
Inventor 黄宏琪
Owner 黄宏琪
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