Improved contact algorithm-based material point method applied to imprint forming simulation
A material point and mass point technology, applied in the field of imprinting, can solve problems such as virtual contact
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[0068] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail in conjunction with the accompanying drawings and examples. The present invention is a material point method based on an improved contact algorithm applied to embossing forming simulation, comprising the following steps:
[0069] Step 1: Establish a mathematical physical model for the embossing process;
[0070] Similar to the finite element method in the imprinting process, the equilibrium governing equation for the coin is as follows:
[0071]
[0072]
[0073] where σ is the Cauchy stress, is the gradient operator, b is the body force per unit mass, ρ is the current material density, ü is the acceleration, i and j represent the components of the space variables, respectively, is the boundary force.
[0074] Step 2: Carry out quadrilateral mesh discretization on the mold;
[0075] The finite element open...
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