Manufacturing method of halftone mask and thin film transistor array substrate

Abstract

The invention discloses a manufacturing method of a halftone mask plate and a thin film transistor array substrate. The halftone mask plate is applied to the manufacturing process of the thin film transistor array substrate, and the halftone mask plate is provided with a pattern used for etching an electrostatic ring on a grid electrode of a thin film transistor. The halftone mask plate is dividedinto: a full-light-transmitting region used for defining the outer structure of an electrostatic ring; at least two shading regions which are arranged at intervals and are used for defining the connecting end of the electrostatic ring; and a semi-transparent region which is arranged between the at least two shading regions and is used for defining a pattern of the electrostatic ring, wherein thetransmissivity of incident light adopted by the semi-transparent region in the manufacturing process is 25%-40%. The invention aims to provides the manufacturing method of the halftone mask plate andthe the thin film transistor array substrate, and the method is capable of improving the electrostatic discharge effect of a TFT array substrate and increasing the yield.

Description

technical field [0001] The present application relates to the field of liquid crystal displays, in particular to a method for manufacturing a halftone mask and a thin film transistor array substrate. Background technique [0002] With the rapid development of color display, the colorization trend of LCD (liquid crystal display) is in the ascendant. The market share of colored LCDs (liquid crystal displays) is increasing year by year. In order to reduce production costs, increase corporate profits, and enhance market competitiveness. Half tone masks (Half Tone Mask, also known as half tone masks) are more and more widely used in the production process of liquid crystal displays. By adopting the half-tone mask, the operations completed by the two upper exposure processes are combined into one, which saves one exposure process, shortens the production cycle, improves production efficiency, reduces production costs, and improves market competitiveness. [0003] However, in th...

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Problems solved by technology

[0003] However, in the half-tone masking process of the existing TFT (English full name is Thin Film Transistor, Chinese translation is thin film transistor), there is often the problem of excessive etching of the electrostatic ring on the TFT array substrate, which leads to the failure of the electrostatic ring on the TFT array substrate. TFT array substrate has poor electrostatic discharge effect and low yield rate

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