Waterfall flow type special jig for chemical etching and preparation method of ultrathin glass

A chemical etching and ultra-thin glass technology, applied in the field of chemical etching thinning, can solve the problems of high fragmentation rate, low processing yield, poor plate thickness uniformity, etc., and achieve the best polishing effect, less reaction time, and high yield. Effect

Pending Publication Date: 2021-04-13
赣州帝晶光电科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a special jig for waterfall flow chemical etching and a method for preparing ultra-thin glass, so as to solve the problems of low processing yield, high fragmentation rate, and poor plate thickness uniformity in the above-mentioned background technology

Method used

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  • Waterfall flow type special jig for chemical etching and preparation method of ultrathin glass
  • Waterfall flow type special jig for chemical etching and preparation method of ultrathin glass
  • Waterfall flow type special jig for chemical etching and preparation method of ultrathin glass

Examples

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Effect test

Embodiment 1

[0037] A preparation method of ultra-thin glass, which includes a special jig for waterfall flow chemical etching as described above, and the steps are as follows:

[0038] Step 1: first use the conventional etching process to thin the glass to a thickness of 0.3mm;

[0039] Step 2: Select polishing powder with a particle size between 0.7-0.9um, and then perform fine polishing on the 0.3mm thin glass in step 1 to completely remove scratches, dirt and other defects on the glass surface to ensure that the surface of the thin glass is After there is no defect and the frame effect is good, the waterfall flow chemical etching operation is carried out;

[0040] Step 3: Perform waterfall chemical etching operation:

[0041] (a). The thin glass after fine polishing in step 2 is mounted on the support frame 3, and a plurality of thin glasses can be placed in parallel on the support frame 3 according to the size of the thin glass;

[0042] (b). Adjust the inclination angle of the supp...

Embodiment 2

[0053] A preparation method of ultra-thin glass, which includes a special jig for waterfall flow chemical etching as described above, and the steps are as follows:

[0054] Step 1: first use the conventional etching process to thin the glass to a thickness of 0.3mm;

[0055] Step 2: Select polishing powder with a particle size between 0.7-0.9um, and then perform fine polishing on the 0.3mm thin glass in step 1 to completely remove scratches, dirt and other defects on the glass surface to ensure that the surface of the thin glass is After there is no defect and the frame effect is good, the waterfall flow chemical etching operation is carried out;

[0056] Step 3: Perform waterfall chemical etching operation:

[0057] (a). The thin glass after fine polishing in step 2 is mounted on the support frame 3, and a plurality of thin glasses can be placed in parallel on the support frame 3 according to the size of the thin glass;

[0058] (b). Adjust the inclination angle of the supp...

Embodiment 3

[0069] A preparation method of ultra-thin glass, which includes a special jig for waterfall flow chemical etching as described above, and the steps are as follows:

[0070] Step 1: first use the conventional etching process to thin the glass to a thickness of 0.3mm;

[0071] Step 2: Select polishing powder with a particle size between 0.7-0.9um, and then perform fine polishing on the 0.3mm thin glass in step 1 to completely remove scratches, dirt and other defects on the glass surface to ensure that the surface of the thin glass is After there is no defect and the frame effect is good, the waterfall flow chemical etching operation is carried out;

[0072] Step 3: Perform waterfall chemical etching operation:

[0073] (a). The thin glass after fine polishing in step 2 is mounted on the support frame 3, and a plurality of thin glasses can be placed in parallel on the support frame 3 according to the size of the thin glass;

[0074] (b). Adjust the inclination angle of the supp...

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PUM

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Abstract

The invention discloses a waterfall flow type special jig for chemical etching and a preparation method of ultrathin glass. The waterfall flow type special jig comprises a mounting base, a rotating shaft is rotatably connected into the mounting base, a supporting frame is fixedly connected to the front end of the rotating shaft, PVC cover plates are connected to the right ends of the upper side and the lower side of the supporting frame in a clamped mode, supporting rods distributed at equal intervals are fixedly connected to the upper end of the supporting frame, and spraying pipes are mounted at the upper ends of the supporting rods; nozzles distributed at equal intervals are fixedly connected to the right end of the spraying pipe. According to the waterfall flow type special jig for chemical etching and the preparation method of the ultrathin glass, a waterfall flow type chemical etching method is adopted, no pressure is needed on the glass, the glass cannot be broken due to stress, the recovery ratio is high, waste liquid is minimum, the utilization rate of acid liquid is high, a large amount of cost is saved, a conveying belt is used for conveying in the whole process, the apparent effect is good, and rework is not needed; the yield is very high, turnover operation is not needed, the fragment risk is reduced, the etching capacity is improved, and the sealing performance of the upper end and the lower end of the glass is ensured.

Description

technical field [0001] The invention relates to the technical field of chemical etching thinning, in particular to a special jig for waterfall flow chemical etching and a preparation method for ultra-thin glass. Background technique [0002] With the development of modern consumer digital technology and the growth of demand, liquid crystal displays are widely used in consumer digital products. Liquid crystal displays made of ultra-thin glass are characterized by their small size, thin shape, light weight, low power consumption, low heat generation, and The characteristics of low voltage, no radiation, and accurate image restoration are favored by people. [0003] Regarding the processing technology of glass substrates, in order to ensure the yield rate of finished Panel products, raw material substrates with a thickness of more than 0.4 mm must be used before breakthroughs in the material industry. Thinning processing after bonding has become an inevitable choice. The curre...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/02
CPCC03C15/02
Inventor 段伟伟许泽芳刘丽
Owner 赣州帝晶光电科技有限公司
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