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Self-cleaning mask based on mixed-coordination metal carbon nano-film and preparation method thereof

A carbon nano-film and self-cleaning technology, applied in protective clothing, textiles, papermaking, clothing, etc., can solve the problems of poor antibacterial and antiviral performance of surgical masks, improve antibacterial and antiviral performance, high-efficiency filtration performance, and avoid adsorption of viruses droplet effect

Active Publication Date: 2021-04-27
SHENZHEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of the above-mentioned deficiencies in the prior art, the object of the present invention is to provide a self-cleaning mask based on mixed-coordination metal carbon nanofilm and its preparation method, aiming to solve the problem of poor antibacterial and antiviral performance of existing surgical masks

Method used

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  • Self-cleaning mask based on mixed-coordination metal carbon nano-film and preparation method thereof
  • Self-cleaning mask based on mixed-coordination metal carbon nano-film and preparation method thereof
  • Self-cleaning mask based on mixed-coordination metal carbon nano-film and preparation method thereof

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Embodiment 1

[0057] (1) Preparation of mixed coordination metal carbon nano-film filter layer.

[0058] Using microwave plasma double-target magnetron sputtering technology to control the ultra-high current density range in the vacuum chamber to 90mA / cm 2 , the range of electron flux (electron transmission per unit time) is 1.10×10 21 mm -2 the s -1 , the substrate bias is 40V, by controlling the deposition time, a carbon nanofilm containing mixed coordination metal carbon nanoparticles and graphene nanocrystals is induced to grow on the hole-type conductive silicon substrate, and the obtained mixed coordination metal carbon nanofilm The thickness is 70nm. Then, alcohol is used to clean the mixed-coordination metal carbon nanofilm and the silicon substrate to remove impurities and prevent impurities from being embedded in the fiber layer. Use a high-frequency electric engraving device with a stripping rate of 11000 / min, set its stripping power to 50W, and peel off the mixed-coordinate ...

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Abstract

The invention provides a self-cleaning mask based on a mixed- coordination metal carbon nano-film. The self-cleaning mask comprises at least two layers of non-woven fabrics; a mixed-coordination metal carbon nano-film filter layer arranged between the at least two layers of non-woven fabrics; and mask belts arranged at the two ends of the at least two layers of non-woven fabrics, wherein the mixed-coordination metal carbon nano-film filter layer comprises molten blow molding fibers and mixed-coordination metal carbon nano-film fragments embedded into the molten blow molding fibers. Due to the defect-state electron capture effect of the mixed-coordination metal carbon nano-film fragments, the mask has efficient filtering performance, hydrophobic performance and good spectral absorption characteristics. In addition, under the illumination condition, the activity of the mixed coordination metal is activated by chemical bonds, viruses on the mask can be inactivated, the mask can be rapidly disinfected and sterilized through a light disinfection method, and therefore the antibacterial and antiviral performance of the mask is improved, and the requirements for long-time wearing and repeated utilization are met.

Description

technical field [0001] The invention relates to the technical field of antibacterial and antiviral masks, in particular to a self-cleaning mask based on a mixed coordination metal carbon nano film and a preparation method thereof. Background technique [0002] The virus is highly contagious and spreads through respiratory droplets. However, the transmission of the virus itself requires respiratory droplets as the virus carrier, which can be transmitted in the form of sneezing droplets or moisture emitted from breathing. In general, the spread of virus-containing droplets can be blocked by wearing a surgical mask to reduce the number and speed of droplets, avoid inhalation by the wearer, or spread of the virus from symptomatic infected persons. Surgical masks are important for controlling respiratory tract infection. Interruption of the spread of infectious diseases plays an important role. [0003] However, the current common surgical masks still have some limitations. Fi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A41D13/11A41D31/02A41D31/30A41D31/10A41D31/04D06M11/83D06M11/74
CPCA41D13/11A41D31/02A41D31/30A41D31/10A41D31/04D06M11/83D06M11/74A41D2500/30
Inventor 张希王旭晟林泽洲刁东风
Owner SHENZHEN UNIV
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