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High-temperature-resistant II-type optical waveguide processing method and system and high-temperature-resistant II-type double-line waveguide

A technology of high temperature resistance and optical waveguide, which is applied in metal processing equipment, optics, manufacturing tools, etc., to achieve the effect of low transmission loss and fast processing method

Active Publication Date: 2021-06-04
PEKING UNIV
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  • Claims
  • Application Information

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Problems solved by technology

[0005] The embodiment of the present application provides a high temperature resistant type II optical waveguide processing method, system and high temperature resistant type II double-wire waveguide, which can solve the problem of how to quickly prepare a high temperature resistant and low loss type II double wire waveguide

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  • High-temperature-resistant II-type optical waveguide processing method and system and high-temperature-resistant II-type double-line waveguide
  • High-temperature-resistant II-type optical waveguide processing method and system and high-temperature-resistant II-type double-line waveguide
  • High-temperature-resistant II-type optical waveguide processing method and system and high-temperature-resistant II-type double-line waveguide

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Embodiment Construction

[0046] The following will clearly and completely describe the technical solutions in the embodiments of the present application with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of this application.

[0047] figure 1 It is a flow chart of the steps of the high temperature resistant type II optical waveguide processing method in the embodiment of the present application, such as figure 1 As shown, the steps for preparing a high-temperature-resistant type II optical waveguide in the embodiment of the present application are as follows:

[0048] The high temperature resistant type II optical waveguide prepared in the present application has the characteristics of high tem...

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Abstract

The invention provides a high-temperature-resistant II-type optical waveguide processing method and system and a high-temperature-resistant II-type double-line waveguide, and relates to the technical field of waveguide preparation. The problem of how to quickly obtain the high-temperature-resistant II-type double-line waveguide can be solved. The high-temperature-resistant II-type optical waveguide processing method comprises the steps: obtaining a Gaussian beam; performing focal field shaping on the Gaussian beam by using a spatial light modulator to obtain a three-dimensional focal field in bifocal light intensity distribution along the laser propagation direction; and carrying out multiple times of in-situ scanning on the sample to be processed by using the laser beam subjected to the focal field shaping to obtain the high-temperature-resistant and low-loss II-type double-line waveguide.

Description

technical field [0001] The present application relates to the technical field of optical waveguide preparation, in particular to a method and system for processing a high-temperature-resistant Type II optical waveguide and a high-temperature-resistant Type II double-wire waveguide. Background technique [0002] The waveguide is the basic unit of an integrated chip. For extreme fields such as aerospace, it is often necessary for devices to withstand high temperatures. However, the working temperature of optical waveguides directly written by glass and polymer materials often used by researchers is limited. High-performance optical waveguides and integrated photonic devices are very necessary in extreme fields such as aerospace. Type I waveguides are easily erased at high temperatures and difficult to retain, so related fields use stress-induced type II double-wire waveguides. [0003] The preparation of waveguides by femtosecond laser direct writing has the advantages of hig...

Claims

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Application Information

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IPC IPC(8): B23K26/06B23K26/082B23K26/50B23K26/70G02B27/09
CPCB23K26/082B23K26/0665B23K26/50B23K26/702G02B27/09
Inventor 闫霖玉龚旗煌李焱李萌
Owner PEKING UNIV
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